公开(公告)号：US11964309B2

公开(公告)日：2024-04-23

申请号：US17738010

申请日：2022-05-06

Applicant: SEMES CO., LTD.

Inventor： Sung Hun Eom ,  Sung Ho Lee ,  Ju Yong Jang

IPC: B08B13/00 ,  B08B3/12 ,  B08B5/02

CPC classification number: B08B3/123 ,  B08B5/023

Abstract: A substrate treatment apparatus includes: a first bath storing a cleaning solution and having a first opening formed in an upper surface thereof; and a first ultrasonic oscillator installed in the first bath and providing ultrasonic waves toward a surface of the cleaning solution exposed by the first opening to form a water film protruding from the surface of the cleaning solution, wherein a substrate is not immersed in the first bath, and a surface of the substrate is placed adjacent to the first opening and cleaned by the water film.

公开(公告)号：US20230195001A1

公开(公告)日：2023-06-22

申请号：US18063410

申请日：2022-12-08

Applicant: Semes Co., Ltd.

Inventor： Jong Kook Bae ,  Tae Won Yun ,  Chang Ho Kim ,  Hyun Yang Jeong ,  Sung Hun Eom

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G03F7/2041 ,  G03F7/70825

Abstract: Disclosed are a buffer unit, in which a plurality of support plates is stacked in a vertical direction and a connection block is provided between the plurality of support plates to prevent vibration generated at the lower end of the support plate from being transmitted from the upper support plate, and a substrate treating apparatus. According to the present invention, it is possible to reduce the vibration generated in the buffer unit, so that there is an effect of improving the efficiency of the substrate treating process.

公开(公告)号：US11965597B2

公开(公告)日：2024-04-23

申请号：US18099942

申请日：2023-01-21

Applicant: SEMES CO., LTD.

Inventor： Sung Hun Eom ,  Nam Ki Hong

IPC: F16J1/09 ,  F16J9/12

CPC classification number: F16J1/09 ,  F16J9/12

Abstract: The present disclosure is to provide a piston assembly in which a particle does not leak out of a cylinder, and including, in an embodiment, a piston body; a piston rod connected to the piston body; a first groove formed in an outer surface of the piston body; and a particle discharge flow path extending from an internal space of the piston body to the outer surface of the piston body.

公开(公告)号：US20230367233A1

公开(公告)日：2023-11-16

申请号：US17990659

申请日：2022-11-19

Applicant: SEMES CO., LTD.

Inventor： Ick Kyun Kim ,  Sung Hun Eom

IPC: G03F7/00 ,  G03F7/16

CPC classification number: G03F7/70925 ,  G03F7/162 ,  H01L21/02087

Abstract: Provided is a substrate processing apparatus capable of effectively removing contaminants in an edge region of a substrate. The substrate processing apparatus comprises: a support configured to rotate a substrate; a first bath installed around the support and configured to store a cleaning liquid and form a first opening on an upper surface thereof; and a first ultrasonic oscillator installed in the first bath and configured to provide an ultrasonic wave towards a surface of the cleaning liquid exposed by the first opening and form a first water film protruding from the surface of the cleaning liquid, wherein the substrate is not immersed in the first bath, and the edge region of the substrate is cleaned by the protruding first water film while rotating the substrate by the support.

公开(公告)号：US20230158696A1

公开(公告)日：2023-05-25

申请号：US18056059

申请日：2022-11-16

Applicant: SEMES CO., LTD.

Inventor： Sung Hun Eom ,  Tae Won Yun

IPC: B26D3/16

CPC classification number: B26D3/163 ,  B26D3/169

Abstract: Disclosed is a cutter apparatus for a double tube for cutting an outer tube in a double pipe including an inner tube and the outer tube, the cutter apparatus for the double tube including: a main body which is grippable by a hand of an operator; a cylindrical protection member which is connected to the main body and into which the inner tube is inserted; and a cutter member including a blade for cutting the outer tube.