公开(公告)号：US20210125854A1

公开(公告)日：2021-04-29

申请号：US17082634

申请日：2020-10-28

Applicant: SEMES Co. Ltd.

Inventor： MIN SUNG HAN ,  WAN JAE PARK ,  YOON JONG JU ,  JAEHOO LEE

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/683 ,  H01J37/32 ,  B25J11/00 ,  B25J15/00 ,  H05B3/00 ,  H05B1/02

Abstract: The present invention relates to a substrate processing apparatus capable of shortening a process time, and the substrate processing apparatus according to the present invention comprises an index chamber having a transfer robot loading/unloading a substrate; a process chamber having a heating means heating the substrate and processing the substrate; a loadlock chamber disposed between the index chamber and the process chamber; and a conveying chamber having a conveying robot conveying the substrate between the process chamber and the loadlock chamber, wherein a pre-heating means is provided in the conveying robot to pre-heat the substrate in a state before processing.

公开(公告)号：US20170345686A1

公开(公告)日：2017-11-30

申请号：US15603227

申请日：2017-05-23

Applicant: SEMES CO., LTD.

Inventor： KIHOON CHOI ,  JINKYU KIM ,  YOON JONG JU ,  MIN SUNG HAN ,  BYUNG MAN KANG

IPC: H01L21/67 ,  B08B5/00 ,  B08B17/02 ,  H01L21/02

CPC classification number: H01L21/67051 ,  B08B3/024 ,  B08B5/00 ,  B08B5/02 ,  B08B17/02 ,  B08B2203/0229 ,  H01L21/02041 ,  H01L21/67173

Abstract: Disclosed are a liquid treating apparatus and a liquid treating method. The liquid treating apparatus includes a chamber that provides a space for processing a substrate, a support unit that is provided in the chamber to support the substrate, an ejection unit that has a nozzle for supplying a cleaning medium to the substrate supported by the support unit, and an auxiliary ejection unit that has an auxiliary nozzle for supplying a contamination prevention liquid to the substrate supported by the support unit.