公开(公告)号：US20230314951A1

公开(公告)日：2023-10-05

申请号：US18117554

申请日：2023-03-06

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Woo Sin JUNG ,  Youngun YUN ,  Jung Suk GOH

IPC: G03F7/00 ,  G03F7/30 ,  G03F7/09 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/002 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/3071

Abstract: A liquid chemical supply apparatus for supplying a liquid chemical to a plurality of substrate processing apparatuses disposed at different heights includes a pump for providing a hydraulic pressure for moving the liquid chemical to the substrate processing apparatuses, a plurality of liquid chemical supply lines having ends connected to the pump and other ends separately connected to the substrate processing apparatuses, to provide passages through which the liquid chemical moves, and a pump vent line connected to the pump to discharge some of the liquid chemical to outside, wherein flow rate calibration lines are connected between the liquid chemical supply lines and the pump vent line.