公开(公告)号：US20210098279A1

公开(公告)日：2021-04-01

申请号：US17034173

申请日：2020-09-28

Applicant: SHIN-ETSU ENGINEERING CO., LTD. ,  SHIBAURA MECHATRONICS CORPORATION

Inventor： Shunya KUBOTA ,  Emi MATSUI ,  Katsuhiro YAMAZAKI ,  Yoshikazu OHTANI ,  Kyouhei TOMIOKA

IPC: H01L21/683 ,  H01L21/67

Abstract: According to one embodiment, a substrate processing apparatus and a substrate processing method that can improve the quality of substrates are provided. The substrate processing apparatus according to one embodiment includes: a table 20 configured to support a processing target W including a substrate W1, a ring W2 surrounding a surrounding of the substrate W1, and a dicing tape W3 adhered to a lower surface of the substrate W1 and a lower surface of the ring W2, and a liquid supplier 50 configured to eject a liquid which does not mix with a processing liquid for processing the substrate W1 and which has a specific gravity heavier than the processing liquid to one of an upper surface of the ring W2 of the processing target W supported by the table 20 rotating by the rotation mechanism 30, an outer circumference end portion of the substrate W1 of the processing target W supported by the table 20 rotating by the rotation mechanism 30, and between the substrate W1 and the ring W2 of the processing target W supported by the table 20 rotating by the rotation mechanism in accordance with a rotation number of the table 20 to supply the liquid between the substrate W1 and the ring W2 of the processing target W.

公开(公告)号：US20160062372A1

公开(公告)日：2016-03-03

申请号：US14939008

申请日：2015-11-12

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Konosuke HAYASHI ,  Takashi OOTAGAKI ,  Emi MATSUI

IPC: G05D11/13 ,  G05D9/12 ,  B05B12/00

CPC classification number: G05D11/13 ,  B05B12/006 ,  B05B13/0242 ,  B05C5/02 ,  G05D9/12 ,  H01L21/67017 ,  H01L21/6708

Abstract: A liquid feeding device that feeds a treatment liquid to a treating device and also recovers the treatment liquid for re-feeding, include feeding tanks having an exhaust passage and an overflow line, and can be switched to one of a feeding mode in which the treatment liquid is fed and a standby mode in which the feeding tank is on standby while accommodating the treatment liquid; a feeding mechanism that feeds the treatment liquid to the treating device from the feeding tank in the feeding mode among the plurality of feeding tanks; a recovery mechanism that recovers and returns the treatment liquid excessive in the treatment device to the feeding tank in the feeding mode; and an on-off mechanism provided in each of the plurality of feeding tanks to block the exhaust passage and the overflow line is provided.

Abstract translation: 将处理液供给到处理装置并回收用于再供给的处理液的液体供给装置包括具有排气通路和溢流管线的供给槽，并且能够切换为进给模式，其中处理 进料液体和备用模式，其中进料罐在容纳处理液体的同时待机; 供给机构，其在所述多个供给槽中以所述供给方式从所述供给槽将所述处理液供给到所述处理装置; 回收机构，其将处理装置中的处理液回收并返回给供给罐; 并且设置在多个供给槽中的每一个中以阻断排气通道和溢流管线的开关机构。