公开(公告)号：US20240321563A1

公开(公告)日：2024-09-26

申请号：US18612641

申请日：2024-03-21

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Shigeki MATSUNAKA ,  Ivan Petrov GANACHEV ,  Yoji TAKIZAWA ,  Hiroshi OOTSUKA

IPC: H01J37/32 ,  C23C14/06 ,  C23C14/34 ,  C23C14/50 ,  H01J37/34

CPC classification number: H01J37/32834 ,  C23C14/0617 ,  C23C14/34 ,  C23C14/505 ,  H01J37/32715 ,  H01J37/32899 ,  H01J37/3426 ,  H01J2237/20214 ,  H01J2237/332 ,  H01J2237/3387

Abstract: A film forming apparatus includes: a rotary table provided in a chamber; a processing unit configured to perform plasma processing on a workpiece transferred by the rotary table; an inner wall configured to define a processing space and having an opening facing the rotary table; an outer wall configured to cover a periphery of the inner wall with a gap, and configured to form an exhaust space having an opening facing the rotary table; and an exhaust port connected to an exhaust device, wherein the processing unit is a film forming part configured to form a film by sputtering, and wherein both ends of the outer wall are in contact with a side surface of the chamber, and a portion of an outer periphery of the inner wall and the side surface of the chamber are partitioned, so that a reaction gas does not circulate in the exhaust space.