公开(公告)号：US20170275171A1

公开(公告)日：2017-09-28

申请号：US15504856

申请日：2015-08-12

Applicant: SHOWA DENKO K.K.

Inventor： Yoshimitsu ISHIHARA ,  Hideaki HAMADA ,  Shigeru SHIMADA ,  Kazuhiko SATO ,  Masayasu IGARASHI ,  Hiroshi UCHIDA

IPC: C01B33/04 ,  B01J29/70 ,  B01J29/44 ,  B01J29/46 ,  B01J37/08 ,  B01J29/74 ,  B01J29/12 ,  B01J29/40 ,  B01J37/04

CPC classification number: C01B33/04 ,  B01J29/126 ,  B01J29/40 ,  B01J29/44 ,  B01J29/46 ,  B01J29/7007 ,  B01J29/7042 ,  B01J29/7407 ,  B01J29/7415 ,  B01J29/7484 ,  B01J29/7607 ,  B01J29/7615 ,  B01J29/7684 ,  B01J37/04 ,  B01J37/088 ,  B01J2229/186 ,  B01J2229/20

Abstract: An object of the present invention is to provide a method for producing oligosilane and in particular to provide a method that can efficiently produce oligosilane at lower temperatures and with an improved yield and selectivity. In the dehydrogenative coupling reaction of hydrosilane, oligosilane can be efficiently produced at an improved selectivity for oligosilane, and in particular at an improved selectivity for disilane, by carrying out the reaction in the presence of zeolite having pores with a minor diameter of at least 0.43 nm and a major diameter of not more than 0.69 nm.