公开(公告)号：US20130175446A1

公开(公告)日：2013-07-11

申请号：US13706426

申请日：2012-12-06

Applicant: SII NANOTECHNOLOGY INC.

Inventor： Ikuko NAKATANI

IPC: H01J37/26

CPC classification number: H01J37/261 ,  G01N1/28 ,  G01N1/286 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/20207 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Provided is a lamella preparation apparatus including an EB column (1), an FIB column (2), a reflected electron detector (5) for detecting charged particles released from a lamella (21), an input unit (10) for setting a first measurement region (41) on an upper side and a second measurement region (42) on a lower side of the lamella (21), and a calculation unit (15) for calculating a slant angle of the lamella (21) from a detected amount of the charged particles generated from the first measurement region (41) and a detected amount of the charged particles generated from the second measurement region (42) by irradiation of the electron beam (8) and a distance between the first measurement region (41) and the second measurement region (42).

Abstract translation: 提供一种薄片制备装置，包括EB柱（1），FIB柱（2），用于检测从薄片（21）释放的带电粒子的反射电子检测器（5），用于设置第一 计算单元（15），用于从所述薄片（21）的下侧的测量区域（41）和所述薄片（21）的下侧的第二测量区域（42） 由第一测量区域（41）产生的带电粒子和通过电子束（8）的照射从第二测量区域（42）产生的带电粒子的检测量和第一测量区域（41）之间的距离， 和第二测量区域（42）。