公开(公告)号：US20250073781A1

公开(公告)日：2025-03-06

申请号：US18593036

申请日：2024-03-01

Applicant: SINTOKOGIO, LTD.

Inventor： Hitoshi NISHIJIMA ,  Masao HIRANO ,  Toshiya TSUJI

IPC: B22F10/66 ,  B24B31/02 ,  B33Y40/20

Abstract: A processing method for an additively manufactured article, the processing method including: accommodating an additively manufactured article containing metal and a medium made of metal in a barrel polishing device; and reducing a roughness of a surface of the additively manufactured article and applying a residual stress to the additively manufactured article by stirring the additively manufactured article and the medium, in which a surface of the medium includes a curved surface.

公开(公告)号：US20230219193A1

公开(公告)日：2023-07-13

申请号：US18076614

申请日：2022-12-07

Applicant: SINTOKOGIO, LTD.

Inventor： Norihito SHIBUYA ,  Hitoshi NISHIJIMA ,  Kazuyoshi MAEDA ,  Kazumichi HIBINO ,  Souichiro NISHIO ,  Kouichi INOUE

IPC: B24C1/04

CPC classification number: B24C1/04

Abstract: A method for manufacturing a component made of a hard brittle material includes: a step of preparing a base material made of a hard brittle material; and a step of embossing the base material. A protrusion protruding in a first direction and a bottom surface surrounding the protrusion are formed on the base material by the embossing. The bottom surface extends in a plane defined by a second direction intersecting the first direction and a third direction intersecting the first direction and the second direction. The bottom surface and a side surface of the protrusion continuous with the bottom surface satisfy a relationship of z=Ax2−Bx in a cross section defined by the first direction and the second direction when the first direction is represented by z and the second direction is represented by x. A is 0.005 to 0.200 and B is 0.050 to 0.955.

公开(公告)号：US20220143777A1

公开(公告)日：2022-05-12

申请号：US17436372

申请日：2020-03-11

Applicant: SINTOKOGIO, LTD.

Inventor： Hitoshi NISHIJIMA

IPC: B24B31/108 ,  B24B31/02

Abstract: A barrel polishing apparatus according to an aspect includes a fixed tank and a rotary disk that define a polishing space. The fixed tank has a predetermined axis as a center axis. The fixed tank includes a cylindrical rigid body and a first lining covering an inner circumferential surface of the cylindrical rigid body. The rotary disk has a disk-shaped rigid body and a second lining covering a surface of the disk-shaped rigid body on the polishing space side, and is rotatably disposed in a state where a gap is formed between the first lining and the second lining. The disk-shaped rigid body has a convex portion protruding toward the polishing space along a predetermined axis direction. The length in the predetermined axis direction of the part overlapping the gap of the convex portion is one-third or more of the length in the predetermined axis direction of the gap.

公开(公告)号：US20190160629A1

公开(公告)日：2019-05-30

申请号：US16323966

申请日：2017-08-02

Applicant: SINTOKOGIO, LTD.

Inventor： Hitoshi NISHIJIMA ,  Norihito SHIBUYA

IPC: B24C1/08 ,  C23C16/44 ,  H01L21/311

Abstract: A method for removing hard adhered objects is provided whereby adhered objects adhering to a jig in a film deposition process using crystal growth are efficiently removed while reducing damage to the jig. This adhered object removal method includes a step for preparing a jetting media with a lower hardness than the jig, a step for jetting the jetting media toward the jig, and a step for forming fracture starting points at the crystal grain boundary of the adhered object when the jetting media collides with the jig, then causing further collision of jetting media to cause the adhered object to dislodge at the crystal grain boundary.