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公开(公告)号：US11643488B2
公开(公告)日：2023-05-09
申请号：US17352400
申请日：2021-06-21
发明人： Nam Kyu Lee , Sun Young Kim , Kwang Kuk Lee , Jin Su Ham
IPC分类号： G03F7/20 , G03F7/00 , C09D125/16 , C09D125/14 , C09D133/12 , C09D133/06 , C08F212/14 , C08F212/32 , C08F220/14 , C09D133/18 , C08F212/08
CPC分类号： C08F220/14 , C08F212/14 , C08F212/32 , C09D125/14 , C09D125/16 , C09D133/066 , C09D133/068 , C09D133/12 , C09D133/18 , G03F7/0002 , G03F7/2037 , C08F212/08 , C08F212/20 , C08F220/14 , C08F212/08 , C08F220/36 , C08F220/14 , C08F212/08 , C08F220/343
摘要： Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.
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公开(公告)号：US11054747B2
公开(公告)日：2021-07-06
申请号：US16106512
申请日：2018-08-21
发明人： Nam Kyu Lee , Sun Young Kim , Kwang Kuk Lee , Jin Su Ham
IPC分类号： G03F7/20 , C08F212/08 , C08F212/32 , C08F212/14 , C09D125/14 , C09D125/16 , G03F7/00 , C09D133/12 , C08F220/14 , C09D133/06 , C09D133/18
摘要： Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.
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公开(公告)号：US10824076B2
公开(公告)日：2020-11-03
申请号：US16106444
申请日：2018-08-21
发明人： Nam Kyu Lee , Sun Young Kim , Kwang Kuk Lee , Jin Su Ham
IPC分类号： C08F220/14 , C08F220/36 , G03F7/20 , C09D125/16 , C08F212/14 , C09D125/14 , C08F212/32 , C09D133/14 , C09D133/12 , G03F7/00 , C08F212/08
摘要： The present invention provides a random copolymer including structural units represented by the following Chemical Formulae 1 to 3 for forming a neutral layer for significantly reducing process time and process costs, and promoting directed self-assembly pattern formation of a block copolymer. The present invention further provides a laminate for forming a pattern including a neutral layer having a small thickness variation value due to washing, by including the random copolymer for forming a neutral layer. The present invention further provides a method for forming a pattern capable of stably vertically orienting a block copolymer on a laminate for forming a neutralized pattern.
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公开(公告)号：US20210389673A1
公开(公告)日：2021-12-16
申请号：US17352400
申请日：2021-06-21
发明人： Nam Kyu Lee , Sun Young Kim , Kwang Kuk Lee , Jin Su Ham
IPC分类号： G03F7/20 , C09D125/16 , C08F212/14 , C09D125/14 , C08F212/32 , G03F7/00 , C09D133/12 , C08F220/14 , C09D133/06 , C09D133/18
摘要： Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.
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公开(公告)号：US10919819B2
公开(公告)日：2021-02-16
申请号：US16317579
申请日：2017-07-05
发明人： Sudevan Sujith , So Hee Sim , Hyo Seung Park , Sun Young Kim , Sang Ick Lee , Han Sol Lee
IPC分类号： C07C2/36 , B01J31/14 , B01J31/24 , C08F10/02 , C08F4/69 , C07C2/08 , C07F9/28 , C08F2/06 , C07C2/32 , C07C2/24
摘要： Provided is a method for oligomerization of ethylene, and more particularly, a method for producing 1-hexene and 1-octene at a high selectivity under an ethylene atmosphere by inducing a remarkably improved catalytic activity while effectively reducing a production amount of polyethylene by introducing the oligomerization catalyst and a cocatalyst mixture containing at least two aluminums together and adjusting the kind of oligomerization catalyst and injection conditions thereof.
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公开(公告)号：US20190308178A1
公开(公告)日：2019-10-10
申请号：US16300973
申请日：2017-05-11
发明人： Sang Ick Lee , Eun Jung Baek , Sun Young Kim , Hyo Seung Park , Min Seon Jung
摘要： The present invention relates to an oligomerization catalyst a transition metal or transition metal precursor, a halogen-substituted organic ligand, and a heteroatom ligand, and to a method for selectively preparing 1-hexene or 1-octene from ethylene using the catalyst.
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公开(公告)号：US20190064670A1
公开(公告)日：2019-02-28
申请号：US16106444
申请日：2018-08-21
发明人： Nam Kyu Lee , Sun Young Kim , Kwang Kuk Lee , Jin Su Ham
IPC分类号： G03F7/20 , C08F212/08 , C08F212/32 , C08F212/14 , C09D125/14 , C09D125/16
摘要： Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.
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公开(公告)号：US10087270B2
公开(公告)日：2018-10-02
申请号：US15711086
申请日：2017-09-21
发明人： Jin Su Ham , Yeon Sik Jung , Sun Young Kim , Yoon Hyung Hur , Kwang Kuk Lee , Seung Won Song
IPC分类号： C08F214/18 , C08F212/08 , C08F220/14 , C08F220/18 , C08F293/00 , C08F4/04 , C08F212/14 , G01Q60/24 , H01J37/28
摘要： Provided is a diblock copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:
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公开(公告)号：US11235315B2
公开(公告)日：2022-02-01
申请号：US16300973
申请日：2017-05-11
发明人： Sang Ick Lee , Eun Jung Baek , Sun Young Kim , Hyo Seung Park , Min Seon Jung
IPC分类号： B01J31/18 , B01J31/14 , B01J31/22 , B01J31/24 , C07C2/32 , C07C2/36 , C08F10/14 , C08F2/44 , C08F10/02 , C08F4/12 , C08F4/69 , C07C11/02
摘要： The present invention relates to an oligomerization catalyst including a transition metal or transition metal precursor, a halogen-substituted organic ligand, and a heteroatom ligand, and to a method for selectively preparing 1-hexene or 1-octene from ethylene using the catalyst.
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公开(公告)号：US20210018843A1
公开(公告)日：2021-01-21
申请号：US17034196
申请日：2020-09-28
发明人： Nam Kyu Lee , Sun Young Kim , Kwang Kuk Lee , Jin Su Ham
IPC分类号： G03F7/20 , C09D125/16 , C08F212/14 , C09D125/14 , C08F212/32 , C08F220/14 , C09D133/14 , C09D133/12 , G03F7/00
摘要： The present invention provides a random copolymer including structural units represented by the following Chemical Formulae 1 to 3 for forming a neutral layer for significantly reducing process time and process costs, and promoting directed self-assembly pattern formation of a block copolymer. The present invention further provides a laminate for forming a pattern including a neutral layer having a small thickness variation value due to washing, by including the random copolymer for forming a neutral layer. The present invention further provides a method for forming a pattern capable of stably vertically orienting a block copolymer on a laminate for forming a neutralized pattern.
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