COIL SUBSTRATE AND ELECTRONIC APPARATUS INCLUDING THE SAME

    公开(公告)号:US20230187120A1

    公开(公告)日:2023-06-15

    申请号:US18164060

    申请日:2023-02-03

    CPC classification number: H01F27/2804 H01F2027/2809

    Abstract: Provided is a coil substrate having an asymmetric structure, in which the area of a coil pattern included in a first region is expanded relative to the area of a coil pattern included in a second region with respect to a virtual axis, and an electronic apparatus having the same. The coil substrate comprises a base layer; and a coil pattern spirally wound on the base layer, wherein an upper portion of the base layer is divided into a first region and a second region based on a void region formed inside the coil pattern, wherein an area of the coil pattern formed in the second region is larger than an area of the coil pattern formed in the first region.

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