公开(公告)号：US09691866B2

公开(公告)日：2017-06-27

申请号：US15252090

申请日：2016-08-30

Applicant: STMicroelectronics (Rousset) SAS

Inventor： Arnaud Regnier ,  Jean-Michel Mirabel ,  Stephan Niel ,  Francesco La Rosa

IPC: H01L29/423 ,  H01L27/11524 ,  H01L29/788 ,  H01L29/78 ,  G11C16/04 ,  H01L29/66 ,  H01L27/11521

CPC classification number: H01L29/42336 ,  G11C16/0433 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/42324 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7831 ,  H01L29/7881 ,  H01L29/7885 ,  H01L29/7889

Abstract: A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.

公开(公告)号：US09461129B2

公开(公告)日：2016-10-04

申请号：US14854542

申请日：2015-09-15

Applicant: STMicroelectronics (Rousset) SAS

Inventor： Arnaud Regnier ,  Jean-Michel Mirabel ,  Stephan Niel ,  Francesco La Rosa

IPC: H01L29/788 ,  H01L29/423 ,  H01L27/115 ,  H01L29/78 ,  G11C16/04 ,  H01L29/66

CPC classification number: H01L29/42336 ,  G11C16/0433 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/42324 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7831 ,  H01L29/7881 ,  H01L29/7885 ,  H01L29/7889

Abstract: A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.

Abstract translation: 形成在半导体衬底中的存储单元包括在衬底中形成的沟槽中垂直延伸的选择栅极，并且通过栅极氧化物的第一层与衬底隔离，水平浮动栅极延伸在衬底上方并与衬底隔离，并与衬底隔离 栅极氧化物的第二层和在浮置栅极上方延伸的水平控制栅极。 选择栅极覆盖浮动栅极的侧面。 浮置栅极仅由第一层栅极氧化物与选择栅极分离，并且与垂直沟道区分离，仅沿着选择栅极在衬底中延伸，仅由栅极氧化物的第二层分离。

公开(公告)号：US20160181265A1

公开(公告)日：2016-06-23

申请号：US14854542

申请日：2015-09-15

Applicant: STMicroelectronics (Rousset) SAS

Inventor： Arnaud Regnier ,  Jean-Michel Mirabel ,  Stephan Niel ,  Francesco La Rosa

IPC: H01L27/115 ,  H01L29/78 ,  H01L29/788 ,  G11C16/14 ,  G11C16/04

CPC classification number: H01L29/42336 ,  G11C16/0433 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/42324 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7831 ,  H01L29/7881 ,  H01L29/7885 ,  H01L29/7889

Abstract: A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.

公开(公告)号：US20160372561A1

公开(公告)日：2016-12-22

申请号：US15252090

申请日：2016-08-30

Applicant: STMicroelectronics (Rousset) SAS

Inventor： Arnaud Regnier ,  Jean-Michel Mirabel ,  Stephan Niel ,  Francesco La Rosa

IPC: H01L29/423 ,  H01L27/115 ,  H01L29/788 ,  H01L29/66

CPC classification number: H01L29/42336 ,  G11C16/0433 ,  H01L27/11521 ,  H01L27/11524 ,  H01L29/42324 ,  H01L29/42328 ,  H01L29/66825 ,  H01L29/7831 ,  H01L29/7881 ,  H01L29/7885 ,  H01L29/7889

Abstract: A memory cell formed in a semiconductor substrate, includes a selection gate extending vertically in a trench made in the substrate, and isolated from the substrate by a first layer of gate oxide, a horizontal floating gate extending above the substrate and isolated from the substrate by a second layer of gate oxide, and a horizontal control gate extending above the floating gate. The selection gate covers a lateral face of the floating gate. The floating gate is separated from the selection gate only by the first layer of gate oxide, and separated from a vertical channel region, extending in the substrate along the selection gate, only by the second layer of gate oxide.

Abstract translation: 形成在半导体衬底中的存储单元包括在衬底中形成的沟槽中垂直延伸的选择栅极，并且通过栅极氧化物的第一层与衬底隔离，水平浮动栅极延伸在衬底上方并与衬底隔离，并与衬底隔离 栅极氧化物的第二层和在浮置栅极上方延伸的水平控制栅极。 选择栅极覆盖浮动栅极的侧面。 浮置栅极仅由第一层栅极氧化物与选择栅极分离，并且与垂直沟道区分离，仅沿着选择栅极在衬底中延伸，仅由栅极氧化物的第二层分离。