公开(公告)号：US20140238852A1

公开(公告)日：2014-08-28

申请号：US14188134

申请日：2014-02-24

Applicant: SULZER METAPLAS GMBH

Inventor： Joerg VETTER ,  Stefan ESSER ,  Jurgen MUELLER ,  Georg ERKENS

IPC: H01J37/32

CPC classification number: H01J37/32669 ,  C23C14/325 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/3402 ,  H01J37/3432 ,  H01J37/345

Abstract: Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (α1) with respect to a first pivot axis.

Abstract translation: 圆柱形蒸发源，其在外筒壁处包括待蒸发的靶材料以及形成至少一部分磁体系统的第一磁场源和第二磁场源，并且布置在圆筒形的内部 用于产生磁场的蒸发源。 在这方面，第一磁场源和第二磁场源设置在载体系统处，使得磁场的形状和/或强度可以根据预定义方案设置在可预定的空间区域中。 在实施例中，载体系统被配置用于设置载体系统的磁场的形状和/或强度，使得第一磁场源布置在第一载体臂处，并且可由可预定的枢转角度（α1）与 相对于第一枢轴。

公开(公告)号：US20140174920A1

公开(公告)日：2014-06-26

申请号：US14163650

申请日：2014-01-24

Applicant: SULZER METAPLAS GMBH

Inventor： Joerg VETTER ,  Stefan ESSER ,  Juergen MUELLER ,  Georg ERKENS

IPC: H01J37/34 ,  H01J37/32

CPC classification number: H01J37/3414 ,  C23C14/243 ,  C23C14/325 ,  C23C14/3407 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/3423 ,  H01J37/3435 ,  H01J37/3497

Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.

Abstract translation: 蒸发源，特别是用于溅射工艺或真空电弧蒸发工艺中，优选阴极真空电弧蒸发工艺。 蒸发源包括内基体，其设置在外承载体中并且相对于外承载体布置，使得在基体和载体之间形成与入口和出口流动连通的冷却空间 身体。 根据本发明，冷却空间包括流入空间和流出空间，并且流入空间经由用于冷却蒸发源的溢流连接与流出空间流动连通，使得冷却流体可以从 入口通过流入空间溢出连接和流出空间到出口。