公开(公告)号：US20140238852A1

公开(公告)日：2014-08-28

申请号：US14188134

申请日：2014-02-24

Applicant: SULZER METAPLAS GMBH

Inventor： Joerg VETTER ,  Stefan ESSER ,  Jurgen MUELLER ,  Georg ERKENS

IPC: H01J37/32

CPC classification number: H01J37/32669 ,  C23C14/325 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/3402 ,  H01J37/3432 ,  H01J37/345

Abstract: Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (α1) with respect to a first pivot axis.

Abstract translation: 圆柱形蒸发源，其在外筒壁处包括待蒸发的靶材料以及形成至少一部分磁体系统的第一磁场源和第二磁场源，并且布置在圆筒形的内部 用于产生磁场的蒸发源。 在这方面，第一磁场源和第二磁场源设置在载体系统处，使得磁场的形状和/或强度可以根据预定义方案设置在可预定的空间区域中。 在实施例中，载体系统被配置用于设置载体系统的磁场的形状和/或强度，使得第一磁场源布置在第一载体臂处，并且可由可预定的枢转角度（α1）与 相对于第一枢轴。

公开(公告)号：US20150008118A1

公开(公告)日：2015-01-08

申请号：US14497665

申请日：2014-09-26

Applicant: SULZER METAPLAS GMBH

Inventor： Joerg VETTER ,  Georg ERKENS

IPC: C23C14/35 ,  C23C14/32

CPC classification number: C23C14/35 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/3266 ,  H01J37/34 ,  H01J37/3405 ,  H01J37/3423

Abstract: Method for the coating of a substrate (S) in a process chamber (3), in which a gas atmosphere is set up and maintained in the process chamber (3) and an anode (6, 61) and a cylindrical vaporization cathode (2, 21, 22) formed as a target (2, 21, 22) are provided in the process chamber (3). The cylindrical vaporization cathode (2, 21, 22) includes the target material (200, 201, 202) and the target material (200, 201, 202) of the cylindrical cathode (2, 21, 22) is transferred into a vapor phase by means of an electrical source of energy (7, 71, 72). A magnetic field source (8, 81, 82) generates a magnetic field is provided in the process chamber (3) in such a way that, a magnetic field strength of the magnetic field can be changed in a preset region of the cylindrical vaporization cathode (2, 21, 22), characterized in that a cylindrical sputtering cathode (2, 21) and a cylindrical arc cathode (2, 22) are simultaneously provided in the process chamber (3) and in that the substrate (S) is coated with an arc vaporization process and/or with a cathode sputtering process.

Abstract translation: 在处理室（3）中涂覆基材（S）的方法，其中在处理室（3）和阳极（6,61）和圆柱形汽化阴极（2）中建立和保持气体气氛 ，21,22）设置在所述处理室（3）中。 圆筒形蒸发阴极（2,21,22）包括目标材料（200,201,202），圆筒形阴极（2,21,22）的靶材料（200,201,202）被转移到气相 借助于电能源（7,71,72）。 磁场源（8,81,82）产生在处理室（3）中提供的磁场，使得磁场的磁场强度可以在圆柱形汽化阴极的预设区域中改变 （2,21,22），其特征在于，在处理室（3）中同时设置圆柱形溅射阴极（2,21）和圆柱形电弧阴极（2,22），并且衬底（S）被涂覆 具有电弧蒸发工艺和/或阴极溅射工艺。

公开(公告)号：US20140174920A1

公开(公告)日：2014-06-26

申请号：US14163650

申请日：2014-01-24

Applicant: SULZER METAPLAS GMBH

Inventor： Joerg VETTER ,  Stefan ESSER ,  Juergen MUELLER ,  Georg ERKENS

IPC: H01J37/34 ,  H01J37/32

CPC classification number: H01J37/3414 ,  C23C14/243 ,  C23C14/325 ,  C23C14/3407 ,  H01J37/32055 ,  H01J37/32614 ,  H01J37/3423 ,  H01J37/3435 ,  H01J37/3497

Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.

Abstract translation: 蒸发源，特别是用于溅射工艺或真空电弧蒸发工艺中，优选阴极真空电弧蒸发工艺。 蒸发源包括内基体，其设置在外承载体中并且相对于外承载体布置，使得在基体和载体之间形成与入口和出口流动连通的冷却空间 身体。 根据本发明，冷却空间包括流入空间和流出空间，并且流入空间经由用于冷却蒸发源的溢流连接与流出空间流动连通，使得冷却流体可以从 入口通过流入空间溢出连接和流出空间到出口。