专利检索 ap:("Saint Louis University") AND inv:"Rui DONG" 第 1 页

1.

发明申请
MASK FREE METHODS OF DEPOSITING COMPOSITIONS TO FORM HETEROSTRUCTURES 审中-公开

公开(公告)号：US20180142109A1

公开(公告)日：2018-05-24

申请号：US15816574

申请日：2017-11-17

申请人： Saint Louis University

发明人： Irma KULJANISHVILI , Rui DONG , Logan MOORE

IPC分类号： C09D11/037 , C01G39/06 , C01G41/00 , C01B19/04 , C23C14/22

CPC分类号： C09D11/037 , C01B19/04 , C01G39/006 , C01G39/06 , C01G41/00 , C01G41/006 , C01P2002/72 , C01P2002/82 , C01P2004/04 , C01P2004/62 , C23C14/22 , C23C16/30

摘要： The present disclosure provides methods of preparing heterostructures of two or more transition metal dichalcogenides on a surface in a pattern in which the method does not require a mask or blocking agent to create a pattern on the surface. Also provided herein are ink compositions which are used in the methods described herein and include precursor materials that generate these transition metal dichalcogenides.