公开(公告)号：US20240196594A1

公开(公告)日：2024-06-13

申请号：US18478978

申请日：2023-09-29

Applicant: Samsung Electronics Co .,LTD

Inventor： Hyeri AN ,  Dongsik Park ,  Sooho Shain ,  Joonsuk Park ,  Keonhee Park ,  Gaeun Lee ,  Jihoon Chang ,  Yujin Cho ,  Hana Cho

IPC: H10B12/00

CPC classification number: H10B12/315 ,  H10B12/01

Abstract: A semiconductor device includes a switching element, and a data storage structure electrically connected to the switching element. The data storage structure includes first electrodes, a second electrode, and a dielectric layer between the first electrodes and the second electrode. The second electrode includes a compound semiconductor layer doped with an impurity element, the compound semiconductor layer includes two or more elements and includes a semiconductor material doped with the impurity element, the two or more elements include a first element and a second element, the first element is silicon (Si), and a concentration of the impurity element in the compound semiconductor layer is in a range of about 0.1 at % to about 5 at %, and a concentration of the first element in the compound semiconductor layer is in a range of about 10 at % to about 15 at %.

公开(公告)号：US20230304155A1

公开(公告)日：2023-09-28

申请号：US18189751

申请日：2023-03-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunhye HWANG ,  Sung Gi Kim ,  Jihyun Lee ,  Yujin Cho ,  Seung Son ,  Gyun Sang Lee ,  Younjoung Cho ,  Byungkeun Hwang

IPC: C23C16/455 ,  C23C16/40 ,  C23C16/44

CPC classification number: C23C16/45553 ,  C23C16/401 ,  C23C16/4408 ,  C23C16/45527

Abstract: Provided is a precursor for depositing a silicon-containing layer, the silicon precursor having a heterocyclic group, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1.




In Formula 1, A1 is a heterocyclic group including one or more nitrogen, and R1 is hydrogen or an alkyl group of 1˜6 carbon atoms. R2 may be an alkyl group of 1˜6 carbon atoms. R3 may be an alkyl group of 1˜6 carbon atoms.