Liquid crystal display device and method for fabricating the same

    公开(公告)号:US10761390B2

    公开(公告)日:2020-09-01

    申请号:US16021119

    申请日:2018-06-28

    Abstract: An LCD device includes first and second substrates and a liquid crystal layer disposed between the substrates. A gate transmitting member is disposed on the first substrate. The gate transmitting member includes a gate line and a gate electrode. A data transmitting member is disposed on the first substrate. The data transmitting member includes a data line, a source electrode, and a drain electrode. A pixel electrode is disposed in a pixel area. The pixel electrode is connected to the source electrode. A first gate insulating layer is disposed on the gate transmitting member. The first gate insulating layer has substantially a same shape as the gate transmitting member and has a greater size than a size of the gate transmitting member. A semiconductor layer is disposed on the first gate insulating layer. The semiconductor layer overlaps the gate electrode, the source electrode, and the drain electrode.

    Liquid crystal display device and method for fabricating the same

    公开(公告)号:US10042225B2

    公开(公告)日:2018-08-07

    申请号:US15149255

    申请日:2016-05-09

    Abstract: An LCD device includes first and second substrates and a liquid crystal layer disposed between the substrates. A gate transmitting member is disposed on the first substrate. The gate transmitting member includes a gate line and a gate electrode. A data transmitting member is disposed on the first substrate. The data transmitting member includes a data line, a source electrode, and a drain electrode. A pixel electrode is disposed in a pixel area. The pixel electrode is connected to the source electrode. A first gate insulating layer is disposed on the gate transmitting member. The first gate insulating layer has substantially a same shape as the gate transmitting member and has a greater size than a size of the gate transmitting member. A semiconductor layer is disposed on the first gate insulating layer. The semiconductor layer overlaps the gate electrode, the source electrode, and the drain electrode.

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