DISPLAY DEVICE
    1.
    发明申请
    DISPLAY DEVICE 有权
    显示设备

    公开(公告)号:US20160049612A1

    公开(公告)日:2016-02-18

    申请号:US14681256

    申请日:2015-04-08

    Abstract: A display device includes a first substrate, a pixel defining layer on the first substrate, the pixel defining layer defining a pixel region on the first substrate, a first electrode on the pixel region, a light emitting layer on the first electrode, a second electrode on the light emitting layer, a second substrate facing the first substrate, and a light scattering layer overlapping the pixel defining layer, the light scattering layer having a non-overlapping relationship with the light emitting layer.

    Abstract translation: 显示装置包括第一基板,第一基板上的像素限定层,限定第一基板上的像素区域的像素限定层,像素区域上的第一电极,第一电极上的发光层,第二电极 在所述发光层上,面对所述第一基板的第二基板和与所述像素限定层重叠的光散射层,所述光散射层与所述发光层具有不重叠的关系。

    DEPOSITION MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME

    公开(公告)号:US20200259091A1

    公开(公告)日:2020-08-13

    申请号:US16861350

    申请日:2020-04-29

    Abstract: A deposition mask includes: a plurality of sub-masks through which deposition material passes to a base layer to form a deposition layer defining a hole therein, each of the sub-masks including: an aperture through which the deposition material passes to the base layer, a total planar area of the aperture corresponding to less than a total planar area of the deposition layer, and a masking surface at which the deposition material does not pass through the sub-mask, the masking surface including a hole-forming portion of which a total planar area thereof corresponds to a total planar area of the hole defined in the deposition layer. The hole-forming portions of the sub-masks have a same shape and planar area as each other, and within each sub-mask, the shape of the hole-forming portion is nested within a shape of the aperture.

    DEPOSITION MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME

    公开(公告)号:US20190140179A1

    公开(公告)日:2019-05-09

    申请号:US16122977

    申请日:2018-09-06

    Abstract: A deposition mask includes: a plurality of sub-masks through which deposition material passes to a base layer to form a deposition layer defining a hole therein, each of the sub-masks including: an aperture through which the deposition material passes to the base layer, a total planar area of the aperture corresponding to less than a total planar area of the deposition layer, and a masking surface at which the deposition material does not pass through the sub-mask, the masking surface including a hole-forming portion of which a total planar area thereof corresponds to a total planar area of the hole defined in the deposition layer. The hole-forming portions of the sub-masks have a same shape and planar area as each other, and within each sub-mask, the shape of the hole-forming portion is nested within a shape of the aperture.

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