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公开(公告)号：US20230261136A1
公开(公告)日：2023-08-17
申请号：US18071723
申请日：2022-11-30
发明人： Kang Young LEE , Hyun Sup LEE , Moon Won CHANG
CPC分类号： H01L33/20 , H01L33/0012 , H01L33/0075 , H01L33/32 , H01L27/156
摘要： A light-emitting element includes a core including a first semiconductor layer including a first portion and a second portion, the first and second portions having side surfaces at different inclinations, a second semiconductor layer disposed on the first semiconductor layer, and an emissive layer disposed between the first semiconductor layer and the second semiconductor layer; a first insulating layer surrounding the first portion of the first semiconductor layer; and a second insulating layer surrounding the second portion of the first semiconductor layer.
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公开(公告)号：US20230223423A1
公开(公告)日：2023-07-13
申请号：US18076493
申请日：2022-12-07
发明人： Hyun Sup LEE , Kang Young LEE , Moon Won CHANG
CPC分类号： H01L27/156 , H01L33/0093 , H01L33/24 , H01L33/38 , H01L33/50 , H01L2933/0016
摘要： A display device includes light emitting elements each including a first area and a second area having different diameters, and a base layer surrounding the first area of the light emitting elements and contacting the first area of each of the light emitting elements. The second area of each of the light emitting elements protrudes from a first surface of the base layer.
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3.发明公开公开(公告)号：US20230143994A1
公开(公告)日：2023-05-11
申请号：US17856464
申请日：2022-07-01
发明人： Soo Youn KIM , Seung Hun KIM , Seung Yong SONG , Hee Jun YANG , Kwan Hyuck YOON , Seung Ho YOON , Moon Won CHANG , Se Hoon JEONG
IPC分类号： H01L27/32
CPC分类号： H01L27/3276 , H01L27/3293 , H01L2227/323
摘要： A display device includes a first substrate including a first contact hole, fan-out lines in a first metal layer, a second substrate on the first metal layer and including a second contact hole, connection lines in a second metal layer and into the second contact hole connected to the fan-out lines, a thin film transistor in an active layer and a third metal layer on the second metal layer, and a flexible film on a surface of the first substrate and into the first contact hole connected to the fan-out lines. An etching angle of the first contact hole between a top surface of the first substrate and an inner surface of the first contact hole is less than an etching angle of the second contact hole between top surfaces of the fan-out lines and an inner surface of the second contact hole.
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公开(公告)号：US20200259091A1
公开(公告)日：2020-08-13
申请号：US16861350
申请日：2020-04-29
发明人： Moon Won CHANG , Oh June KWON , Soo Youn KIM
摘要： A deposition mask includes: a plurality of sub-masks through which deposition material passes to a base layer to form a deposition layer defining a hole therein, each of the sub-masks including: an aperture through which the deposition material passes to the base layer, a total planar area of the aperture corresponding to less than a total planar area of the deposition layer, and a masking surface at which the deposition material does not pass through the sub-mask, the masking surface including a hole-forming portion of which a total planar area thereof corresponds to a total planar area of the hole defined in the deposition layer. The hole-forming portions of the sub-masks have a same shape and planar area as each other, and within each sub-mask, the shape of the hole-forming portion is nested within a shape of the aperture.
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公开(公告)号：US20190140179A1
公开(公告)日：2019-05-09
申请号：US16122977
申请日：2018-09-06
发明人： Moon Won CHANG , Oh June KWON , Soo Youn KIM
摘要： A deposition mask includes: a plurality of sub-masks through which deposition material passes to a base layer to form a deposition layer defining a hole therein, each of the sub-masks including: an aperture through which the deposition material passes to the base layer, a total planar area of the aperture corresponding to less than a total planar area of the deposition layer, and a masking surface at which the deposition material does not pass through the sub-mask, the masking surface including a hole-forming portion of which a total planar area thereof corresponds to a total planar area of the hole defined in the deposition layer. The hole-forming portions of the sub-masks have a same shape and planar area as each other, and within each sub-mask, the shape of the hole-forming portion is nested within a shape of the aperture.
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6.发明申请APPARATUS OF FORMING PATTERN, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING THE SAME 审中-公开形成图案的装置，其制造方法及其形成方法公开(公告)号：US20140096693A1
公开(公告)日：2014-04-10
申请号：US13778378
申请日：2013-02-27
发明人： Sang Hoon KIM , Youngdae KIM , Moon Won CHANG
CPC分类号： B41C1/08 , B41F9/00 , B41M1/24 , G03F7/0002 , H01L51/0004
摘要： A pattern forming apparatus includes a substrate receiving part on which a printed substrate formed with an organic layer thereon is disposed, and a rotation roll that removes portions of the organic layer to form a pattern. The rotation roll includes a rotation body having a cylindrical shape, a pivot engaged with the rotation body to transfer a rotational force to the rotation body, and a blanket attached to an outer surface of the rotation body. The blanket includes an embossed pattern formed on a surface thereof.
摘要翻译： 图案形成装置包括：基板接收部，其上设置有形成有有机层的印刷基板;旋转辊，其移除部分有机层以形成图案。 旋转辊包括具有圆筒形状的旋转体，与旋转体接合的枢轴以将旋转力传递到旋转体，以及附接到旋转体的外表面的橡皮布。 毯子包括在其表面上形成的压花图案。
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