PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS
    1.
    发明申请
    PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
    等离子体增强化学蒸气沉积装置

    公开(公告)号:US20170002468A1

    公开(公告)日:2017-01-05

    申请号:US15049162

    申请日:2016-02-22

    摘要: A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.

    摘要翻译: 包括腔室的等离子体增强化学气相沉积(PECVD)装置; 室中的上电极; 上部电极中的喷射单元,用于将从室外引入的气体朝向室内的基板喷射; 可以安装基板的基座; 在基座的边缘处的掩模框架中的多个掩模支撑件,所述掩模支撑件由导电材料形成,所述导电材料通过支撑掩模来提供弹性力以维持和控制所述掩模的水平; 以及向上部电极供电的电源单元。

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210066656A1

    公开(公告)日:2021-03-04

    申请号:US16985969

    申请日:2020-08-05

    IPC分类号: H01L51/52 H01L51/56

    摘要: A display device includes a substrate, a light-emitting element layer disposed on the substrate, a first encapsulation layer and a second encapsulation layer which are disposed on the light-emitting element layer, and a buffer layer which covers the first encapsulation layer and the second encapsulation layer. The second encapsulation layer includes a first film, a second film disposed on the first film, and a third film disposed between the first film and the second film, and a side surface of the third film is disposed more inward than a side surface of the first film and a side surface of the second film.