SYSTEM FOR TRANSFERRING SUBSTRATE AND METHOD FOR TRANSFERRING SUBSTRATE USING THE SAME

    公开(公告)号:US20200176295A1

    公开(公告)日:2020-06-04

    申请号:US16565670

    申请日:2019-09-10

    Abstract: A system for transferring a substrate includes a substrate transporter at which is captured a first image with which a position of the substrate at the substrate transporter is determined; a tray at which is captured a second image with which a position of each of a plurality of substrates relative to the tray is determined; a substrate mover with which the substrate is movable in a revolving manner between the substrate transporter and the tray, the substrate mover including: an arm portion movable in the revolving manner between the substrate transporter and the tray, and a substrate securing portion movable together with the arm portion; and an imager with which the first image and the second image are captured, the imager connected to the arm portion and movable in the revolving manner between the substrate transporter and the tray together with the arm portion.

    LASER ETCHING APPARATUS AND LASER ETCHING METHOD USING THE SAME

    公开(公告)号:US20230294209A1

    公开(公告)日:2023-09-21

    申请号:US18097122

    申请日:2023-01-13

    CPC classification number: B23K26/362

    Abstract: A laser etching method include performing a first emission process by emitting a laser beam from a laser module toward a substrate fastened to a chuck in a laser etching chamber, moving a protection window between the chuck and the laser module in a first direction by a first distance after the performing the first emission process, performing a second emission process by emitting a laser beam from the laser module after the moving the protection window in the first direction by the first distance, moving the protection window in an opposite direction of the first direction by a second distance after the performing the second emission process, and performing a third emission process by emitting a laser beam from the laser module after the moving the protection window in the opposite direction of the first direction by the second distance.

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