中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

5 records (took 0.014 seconds)

    FIXING MODULE FOR FIXING AN OPTICAL SYSTEM TO AN OPTICAL APPARATUS AND AN OPTICAL APPARATUS INCLUDING THE SAME
    1.
    发明申请
    FIXING MODULE FOR FIXING AN OPTICAL SYSTEM TO AN OPTICAL APPARATUS AND AN OPTICAL APPARATUS INCLUDING THE SAME 有权
    用于将光学系统固定到光学装置的固定模块和包括其的光学装置

    公开(公告)号：US20150260211A1

    公开(公告)日：2015-09-17

    申请号：US14563463

    申请日：2014-12-08

    Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG DISPLAY CO., LTD.

    Inventor： Sang-Joon HONG ,  Hi-Kuk LEE ,  Sang-Don JANG

    IPC: F16B11/00 ,  F21V21/00 ,  G02B7/02

    CPC classification number: G02B7/025 ,  F16B11/008 ,  Y10T403/472

    Abstract: Disclosed is a fixing module for fixing an optical system to an optical apparatus, including a coupling unit having a plate to couple to the apparatus, the coupling unit having a first penetrating space at a central portion thereof and a protruding portion protruded downwards from the plate; a first fixing unit combinable with the coupling unit and having a receiving space including a thermosetting resin such that the protruding portion is fixed into the thermosetting resin; and a second fixing unit combinable with the first fixing unit and having a second penetrating space communicating with the first penetrating space, such that the optical system can penetrate through the first and the second penetrating spaces and be fixed by the second fixing unit.

    Abstract translation: 公开了一种用于将光学系统固定到光学设备的固定模块，包括具有耦合到设备的板的耦合单元，耦合单元在其中心部分具有第一穿透空间和从板向下突出的突出部分 ; 第一固定单元，其与所述联接单元组合并且具有包含热固性树脂的容纳空间，使得所述突出部分固定到所述热固性树脂中; 以及第二固定单元，其与所述第一固定单元可组合并且具有与所述第一穿透空间连通的第二穿透空间，使得所述光学系统可以穿透所述第一穿透空间和所述第二穿透空间并且被所述第二定影单元固定。

    METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME
    2.
    发明申请
    METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME 有权
    测量暴露光和曝光系统的均匀性的方法

    公开(公告)号：US20130141714A1

    公开(公告)日：2013-06-06

    申请号：US13669751

    申请日：2012-11-06

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jung-In PARK ,  Cha-Dong KIM ,  Su-Yeon SIM ,  Sang-Hyun YUN ,  Hi-Kuk LEE

    IPC: G01J1/00

    CPC classification number: G01J1/00 ,  G03F7/20 ,  G03F7/70133

    Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

    Abstract translation: 曝光系统包括曝光装置，掩模，测试图案部分和均匀度测量部分。 曝光装置包括第一模块和第二模块。 第一和第二模块各自发光并且在重叠区域中重叠。 掩模包括彼此间隔开的多个传输部分。 每个传输部分具有小于重叠区域的宽度的宽度。 测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。 均匀度测量部件测量测试图案的均匀性。

    EXPOSURE APPARATUS AND METHOD THEREOF
    4.
    发明申请
    EXPOSURE APPARATUS AND METHOD THEREOF 有权
    曝光装置及其方法

    公开(公告)号：US20150049316A1

    公开(公告)日：2015-02-19

    申请号：US14226621

    申请日：2014-03-26

    Applicant: Samsung Display Co., Ltd.

    Inventor： Cha-Dong KIM ,  Hoon KANG ,  Chang-Hoon KIM ,  Sang-Hyun YUN ,  Jung-In PARK ,  Woo-Yong SUNG ,  Ki-Beom LEE ,  Hi-Kuk LEE ,  Jae-Hyuk CHANG

    IPC: G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

    Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

    Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

Patent Agency Ranking