公开(公告)号：US20190019819A1

公开(公告)日：2019-01-17

申请号：US16135003

申请日：2018-09-19

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo SHIM ,  Jun-Gi KIM ,  Yong-Jun PARK ,  Yang-Ho JUNG ,  Jin-Ho JU

IPC: H01L27/12 ,  G03F1/22 ,  G03F1/38

CPC classification number: H01L27/1288 ,  G03F1/22 ,  G03F1/38 ,  H01L27/124

Abstract: An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

公开(公告)号：US20130335664A1

公开(公告)日：2013-12-19

申请号：US13733289

申请日：2013-01-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung-Bo SHIM ,  Yang-Ho JUNG ,  Jin-Ho JU ,  Da-Woon KIM ,  Jun-Gi KIM

IPC: G02F1/1339

CPC classification number: G02F1/1339 ,  G02F1/133377 ,  G02F1/1341

Abstract: A display panel includes a substrate, a thin film transistor on the substrate, a first electrode electrically connected to the thin film transistor, a first insulation layer covering the first electrode, an image displaying layer disposed on the first insulation layer, a second insulation layer disposed on the image displaying layer, a second electrode disposed on the second insulation layer and insulated from the first electrode, and a protecting layer disposed on the second electrode. The protecting layer surrounds a portion of an upper surface and a side surface of the image displaying layer. The protecting layer includes a light curable material.

Abstract translation: 显示面板包括基板，基板上的薄膜晶体管，与薄膜晶体管电连接的第一电极，覆盖第一电极的第一绝缘层，设置在第一绝缘层上的图像显示层，第二绝缘层 设置在图像显示层上的第二电极，设置在第二绝缘层上并与第一电极绝缘的第二电极以及设置在第二电极上的保护层。 保护层围绕图像显示层的上表面和侧表面的一部分。 保护层包括可光固化材料。

公开(公告)号：US20200127022A1

公开(公告)日：2020-04-23

申请号：US16720177

申请日：2019-12-19

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo SHIM ,  Jun-Gi KIM ,  Yong-Jun PARK ,  Yang-Ho JUNG ,  Jin-Ho JU

IPC: H01L27/12 ,  G03F1/22 ,  G03F1/38

Abstract: An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

公开(公告)号：US20130210202A1

公开(公告)日：2013-08-15

申请号：US13677172

申请日：2012-11-14

Applicant: Samsung Display Co., LTD.

Inventor： Hyang-Shik KONG ,  Seung-Bo SHIM ,  Jin-Ho JU ,  Jun-Gi KIM

IPC: H01L29/786 ,  H01L21/02

CPC classification number: H01L29/786 ,  H01L21/02697 ,  H01L21/0274 ,  H01L21/32115 ,  H01L29/66765 ,  H01L29/78603 ,  H01L29/7869

Abstract: A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion.

Abstract translation: 平面化基板的方法包括在基底基板的第一表面上形成导电图案，在基底基板和导电图案上形成正性光致抗蚀剂层，通过照射基底基板的第二表面将正性光致抗蚀剂层曝光 在第一表面与光相对的位置，显影正性光致抗蚀剂层以在导电图案上形成突出部分，在基底基板和突出部分上形成平坦化层，并且消除突出部分。