Imprint master template and method of manufacturing the same

    公开(公告)号:US11376800B2

    公开(公告)日:2022-07-05

    申请号:US16983326

    申请日:2020-08-03

    摘要: An imprint master template including a first fine pattern unit having an upper surface on which a fine pattern is formed, a second fine pattern unit disposed adjacent to the first fine pattern unit and having an upper surface on which a fine pattern is formed, and a supporting part configured to support the first fine pattern unit and the second fine pattern unit. A side surface of the first fine pattern unit faces a side surface of the second fine pattern unit. The side surface of the first fine pattern unit includes a first surface which is perpendicular to the upper surface and a second surface which is inclined at a predetermined angle with respect to the first surface. The side surface of the second fine pattern unit includes a first surface which is perpendicular to the upper surface and a second surface which is inclined at a predetermined angle with respect to the first surface.

    Imprint master template and method of manufacturing the same

    公开(公告)号:US10751953B2

    公开(公告)日:2020-08-25

    申请号:US15469946

    申请日:2017-03-27

    摘要: A method of manufacturing an imprint master template including forming a cutting line guide at an edge of a first fine pattern unit having an upper surface on which a fine pattern is formed; cutting a wafer substrate by a cleaving process along the cutting line guide so that a cutting surface is formed, the cutting surface having a preliminary second surface where the cutting line guide was formed and a first surface which is formed by the cleaving process; polishing the preliminary second surface to form a second surface which is inclined at a predetermined angle with respect to the first surface; and bonding the first fine pattern unit and the second fine pattern unit to each other with the first surface of the first fine pattern unit facing the first surface of the second fine pattern unit.