公开(公告)号：US20140295626A1

公开(公告)日：2014-10-02

申请号：US13964371

申请日：2013-08-12

申请人： Samsung Display Co., Ltd.

发明人： Hong-Sick PARK ,  Young-Jun KIM ,  Young-Woo PARK ,  Wang-Woo LEE ,  Won-Guk SEO ,  Sam-Young CHO ,  Seung-Yeon HAN ,  Gyu-Po KIM ,  Hyun-Cheol SHIN ,  Ki-Beom LEE

IPC分类号： C23F1/18 ,  H01L27/12 ,  H01L21/28 ,  H01L21/67

CPC分类号： C23F1/18 ,  H01L21/67075 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/4908 ,  H01L29/66969 ,  H01L29/78633 ,  H01L29/7869

摘要： An etchant composition includes about 25 percent by weight to about 35 percent by weight of phosphoric acid, about 3 percent by weight to about 9 percent by weight of nitric acid, about 10 percent by weight to about 20 percent by weight of acetic acid, about 5 percent by weight to about 10 percent by weight of a nitrate, about 6 percent by weight to about 15 percent by weight of a sulfonic acid, about 1 percent by weight to about 5 percent by weight of an amine compound including a carboxyl group, about 0.1 percent by weight to about 1 percent by weight of a water-soluble amino acid, about 0.01 percent by weight to about 1 percent by weight of an azole compound, and water.

摘要翻译： 蚀刻剂组合物包括约25重量％至约35重量％的磷酸，约3重量％至约9重量％的硝酸，约10重量％至约20重量％的乙酸，约 5重量％至10重量％的硝酸盐，约6重量％至约15重量％的磺酸，约1重量％至约5重量％的包含羧基的胺化合物， 约0.1重量％至约1重量％的水溶性氨基酸，约0.01重量％至约1重量％的唑化合物和水。