公开(公告)号：US20140097006A1

公开(公告)日：2014-04-10

申请号：US13874934

申请日：2013-05-01

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hong-Sick PARK ,  Wang-Woo LEE ,  Bong-Kyun KIM ,  Jong-Hyun CHOUNG ,  Young-Woo PARK ,  Gyu-Po KIM ,  Won-Guk SEO ,  Hyun-Cheol SHIN ,  Seung-Yeon HAN ,  Ki-Beom LEE ,  Sam-Young CHO

IPC: H05K3/06 ,  H05K1/09

CPC classification number: H05K3/067 ,  H01L27/1225 ,  H01L27/124 ,  H01L29/458 ,  H01L29/4908 ,  H01L29/7869 ,  H05K1/09

Abstract: A wet etching composition usable for etching a copper-based wiring layer includes between about 40% by weight to about 60% by weight of phosphoric acid, between about 1% by weight to about 10% by weight of nitric acid, between about 3% by weight to about 15% by weight of acetic acid, between about 0.01% by weight to about 0.1% by weight of a copper-ion compound, between about 1% by weight to about 10% by weight of a nitric salt, between about 1% by weight to about 10% by weight of an acetic salt, and a remainder of water

Abstract translation: 可用于蚀刻铜基布线层的湿蚀刻组合物包括约40重量％至约60重量％的磷酸，约1重量％至约10重量％的硝酸，约3重量％ 至约15重量％的乙酸，约0.01重量％至约0.1重量％的铜离子化合物，约1重量％至约10重量％的硝酸盐之间，介于约 1重量％至约10重量％的乙酸盐，剩余的水

公开(公告)号：US20150259598A1

公开(公告)日：2015-09-17

申请号：US14725849

申请日：2015-05-29

Applicant: Samsung Display Co., Ltd. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： In-Bae KIM ,  Jong-Hyun CHOUNG ,  Seon-Il KIM ,  Hong-Sick PARK ,  Wang Woo LEE ,  Jae-Woo JEONG ,  In Seol KUK ,  Sang-Tae KIM ,  Young-Chul PARK ,  Keyong Bo SHIM ,  In-Ho YU ,  Young-Jin YOON ,  Suck-Jun LEE ,  Joon-Woo LEE ,  Sang-Hoon JANG ,  Young-Jun JIN

IPC: C09K13/08 ,  H01L21/32 ,  H01L21/3213 ,  H01L27/12

CPC classification number: C22F1/18 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  C09K13/08 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/28008 ,  H01L21/32 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1288 ,  H05K3/067

Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

Abstract translation: 一种蚀刻剂组合物，其包含基于蚀刻剂组合物的总重量为约0.5重量％至约20重量％的过硫酸盐，约0.5重量％至约0.9重量％的氟化铵，约1重量％至约10重量％ 无机酸的重量百分比，约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约10.0重量％的磺酸，约5重量％至约10重量％的有机酸，或 其盐，剩余的水。 蚀刻剂组合物可以被配置为蚀刻包括铜和钛的金属层，以形成可以包括在显示装置的薄膜晶体管阵列面板中的金属线。

公开(公告)号：US20210296364A1

公开(公告)日：2021-09-23

申请号：US17264255

申请日：2019-03-29

Applicant: Samsung Display Co., LTD.

Inventor： Hyun-Eok SHIN ,  Hong-Sick PARK ,  Sangwoo SOHN ,  Sang-Gab KIM ,  Gyungmin BAEK ,  Sang-Won SHIN

IPC: H01L27/12 ,  H01L27/32

Abstract: A display substrate may include a substrate and a wiring on the substrate. The wiring may include a metal oxide layer including at least one oxide selected from tantalum (Ta), niobium (Nb), and titanium (Ti), and a metal layer on the metal oxide layer and including copper (Cu), and a thickness of the metal oxide layer may be in a range of about 30 angstroms (Å) to about 50 Å.

公开(公告)号：US20140295599A1

公开(公告)日：2014-10-02

申请号：US14307155

申请日：2014-06-17

Applicant: Samsung Display Co, Ltd. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： Hong-Sick PARK ,  Wang-Woo LEE ,  Sang-Tae KIM ,  Joon-Woo LEE ,  Young-Chul PARK ,  Young-Jun JIN ,  Kyong-Min KANG ,  Young-Jin YOON ,  Suck-Jun LEE ,  O-Byoung KWON ,  In-Ho YU ,  Sang-Hoon JANG ,  Min-Ki LIM ,  Dong-Ki KIM

IPC: H01L27/12 ,  H01L21/3213

CPC classification number: H01L27/127 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/41733

Abstract: An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.

Abstract translation: 蚀刻剂包括：5〜20重量％的过硫酸盐，1〜10重量％的至少一种无机酸化合物，无机酸盐或其混合物，0.3〜5重量％的环状胺化合物，1〜 10重量％的至少一种有机酸化合物，有机酸盐或其混合物，0.1至5重量％的对甲苯磺酸和水，基于蚀刻剂的总重量。 另外，铜 - 钛蚀刻剂还含有0.01〜2重量％的含氟化合物。 还公开了使用蚀刻剂形成显示装置的方法和显示装置。

公开(公告)号：US20140295626A1

公开(公告)日：2014-10-02

申请号：US13964371

申请日：2013-08-12

Applicant: Samsung Display Co., Ltd.

Inventor： Hong-Sick PARK ,  Young-Jun KIM ,  Young-Woo PARK ,  Wang-Woo LEE ,  Won-Guk SEO ,  Sam-Young CHO ,  Seung-Yeon HAN ,  Gyu-Po KIM ,  Hyun-Cheol SHIN ,  Ki-Beom LEE

IPC: C23F1/18 ,  H01L27/12 ,  H01L21/28 ,  H01L21/67

CPC classification number: C23F1/18 ,  H01L21/67075 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/4908 ,  H01L29/66969 ,  H01L29/78633 ,  H01L29/7869

Abstract: An etchant composition includes about 25 percent by weight to about 35 percent by weight of phosphoric acid, about 3 percent by weight to about 9 percent by weight of nitric acid, about 10 percent by weight to about 20 percent by weight of acetic acid, about 5 percent by weight to about 10 percent by weight of a nitrate, about 6 percent by weight to about 15 percent by weight of a sulfonic acid, about 1 percent by weight to about 5 percent by weight of an amine compound including a carboxyl group, about 0.1 percent by weight to about 1 percent by weight of a water-soluble amino acid, about 0.01 percent by weight to about 1 percent by weight of an azole compound, and water.

Abstract translation: 蚀刻剂组合物包括约25重量％至约35重量％的磷酸，约3重量％至约9重量％的硝酸，约10重量％至约20重量％的乙酸，约 5重量％至10重量％的硝酸盐，约6重量％至约15重量％的磺酸，约1重量％至约5重量％的包含羧基的胺化合物， 约0.1重量％至约1重量％的水溶性氨基酸，约0.01重量％至约1重量％的唑化合物和水。

公开(公告)号：US20140024206A1

公开(公告)日：2014-01-23

申请号：US13718557

申请日：2012-12-18

Applicant: SAMSUNG DISPLAY CO., LTD. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： In-Bae KIM ,  Jong-Hyun CHOUNG ,  Seon-Il KIM ,  Hong-Sick PARK ,  Wang Woo LEE ,  Jae-Woo JEONG ,  In Seol KUK ,  Sang-Tae KIM ,  Young-Chul PARK ,  Keyong Bo SHIM ,  In-Ho YU ,  Young-Jin YOON ,  Suck-Jun LEE ,  Joon-Woo LEE ,  Sang-Hoon JANG ,  Young-Jun JIN

IPC: C23F1/18 ,  H01L21/28

CPC classification number: C22F1/18 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  C09K13/08 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/28008 ,  H01L21/32 ,  H01L21/32134 ,  H01L27/124 ,  H01L27/1288 ,  H05K3/067

Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

Abstract translation: 一种蚀刻剂组合物，其包含基于蚀刻剂组合物的总重量为约0.5重量％至约20重量％的过硫酸盐，约0.5重量％至约0.9重量％的氟化铵，约1重量％至约10重量％ 无机酸的重量百分比，约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约10.0重量％的磺酸，约5重量％至约10重量％的有机酸或 其盐，剩余的水。 蚀刻剂组合物可以被配置为蚀刻包括铜和钛的金属层，以形成可以包括在显示装置的薄膜晶体管阵列面板中的金属线。

公开(公告)号：US20130099242A1

公开(公告)日：2013-04-25

申请号：US13715726

申请日：2012-12-14

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Wang-Woo LEE ,  Hong-Sick PARK

IPC: H01L33/00

CPC classification number: H01L33/0041 ,  H01L27/1218 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1292

Abstract: A display substrate having a low resistance signal line and a method of manufacturing the display substrate are provided. The display substrate includes an insulation substrate, a gate line, a data line and a pixel electrode. The gate line gate line is formed through a sub-trench and an opening portion. The sub-trench is formed in the insulation substrate and the opening portion is formed through a planarization layer on the insulation substrate at a position corresponding to the position of the sub-trench. The data line crosses the gate line. The pixel electrode is electrically connected to the gate line and the data line through a switching element. Thus, a signal line is formed through a trench formed by using a planarization layer and an insulation substrate, so that a resistance of the signal line may be reduced.

Abstract translation: 提供具有低电阻信号线的显示基板和制造显示基板的方法。 显示基板包括绝缘基板，栅极线，数据线和像素电极。 栅极线栅极线通过子沟槽和开口部分形成。 子沟槽形成在绝缘衬底中，并且开口部分通过绝缘衬底上的与子沟槽位置对应的位置处的平坦化层形成。 数据线穿过栅极线。 像素电极通过开关元件电连接到栅极线和数据线。 因此，通过使用平坦化层和绝缘基板形成的沟槽形成信号线，使得信号线的电阻可能降低。