摘要:
A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.
摘要:
A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
摘要:
FIG. 1 is a perspective view of the notebook computer, wherein the display is in an unfolded state; FIG. 2 is a front view thereof; FIG. 3 is a rear view thereof; FIG. 4 is a left side view thereof; FIG. 5 is a right side view thereof; FIG. 6 is a top view thereof; and, FIG. 7 is a bottom view thereof. FIG. 8 is a perspective view of the notebook computer, wherein the display is in a folded state; FIG. 9 is a front view thereof; FIG. 10 is a rear view thereof; FIG. 11 is a left side view thereof; FIG. 12 is a right side view thereof; FIG. 13 is a top view thereof; and FIG. 14 is a bottom view thereof; and, FIG. 15 is a perspective view of the notebook computer, wherein the notebook computer and the display are both in a folded state. The dash-dot broken lines shown in FIGS. 1-3, 6-10, and 13-15 form boundaries of the claimed design. The dashed broken lines, showing lettering and icons on the folding leaves of the notebook computer in FIG. 15, represent environment that forms no part of the claimed design. All other broken lines in FIGS. 1-15 represent portions of the design and form no part thereof.
摘要:
A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm.
摘要:
FIG. 1 is a perspective view of a display module according to an embodiment of the present design; FIG. 2 is a front view thereof; FIG. 3 is a rear view thereof; FIG. 4 is a left side view thereof; FIG. 5 is a right side view thereof; FIG. 6 is a top view thereof; and, FIG. 7 is a bottom view thereof. The broken lines shown in the drawings show portions of the display module that form no part of the claimed design.
摘要:
FIGS. 1-7 show the notebook computer in a first position of use where the sub-display protrudes from the main display. FIG. 1 is a perspective view of the notebook computer; FIG. 2 is a front view thereof; FIG. 3 is a rear view thereof; FIG. 4 is a left side view thereof; FIG. 5 is a right side view thereof; FIG. 6 is a top view thereof; and FIG. 7 is a bottom view thereof. FIGS. 8-14 show the notebook computer in a second position of use where the sub-display is inserted into the main display. FIG. 8 is a perspective view of the notebook computer; FIG. 9 is a front view thereof; FIG. 10 is a rear view thereof; FIG. 11 is a left side view thereof; FIG. 12 is a right side view thereof; FIG. 13 is a top view thereof; and, FIG. 14 is a bottom view thereof. The broken lines shown in the figures that are immediately adjacent to the shaded areas and define unshaded regions represent the bounds of the claim. The bounds of the left, right, top, and bottom sides of the large display screen extend beyond the solid line showing of the edges, wherein only the broken line edges form no part of the claimed design. All other broken lines, including the features within broken line boundaries, are directed to environment. The broken lines form no part of the claimed design.
摘要:
A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm.