公开(公告)号：US10946577B2

公开(公告)日：2021-03-16

申请号：US15946790

申请日：2018-04-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Byeong Sang Kim ,  Jung Wook Kim ,  Kyung Bin Park ,  Ki Ju Sohn ,  Eun Soo Hwang

IPC: B29C59/04 ,  B41L47/46 ,  G03F7/00

Abstract: An imprinting apparatus includes a first frame, a pressure roller rotatably supported on a first end of the first frame, a second frame including a support portion coupled to a second end of the first frame, and at least one guide portion coupled to the support portion to be laterally movable, and at least one load roller supported by the at least one guide portion, the at least one load roller being movable in a vertical direction while being rotatable and contacting a surface of the pressure roller on an upper portion of the pressure roller according to a lateral movement of the guide portion, the at least one load roller to press the pressure roller by force exerted by a load of the at least one load roller.

公开(公告)号：US10647107B2

公开(公告)日：2020-05-12

申请号：US15982146

申请日：2018-05-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Dong Wook Kim ,  Byeong Sang Kim ,  Kyung Bin Park ,  Ki Ju Sohn ,  Ju Hyun Lee

IPC: B41F23/04 ,  B41M7/00 ,  F26B3/28 ,  B05D3/06

Abstract: An ultraviolet curing apparatus includes a housing, a plurality of ultraviolet light emitting diodes (LEDs) arranged in a length direction of the housing, and at least one shutter part coupled to the housing to be movable in the length direction, to cover at least a portion of the plurality of ultraviolet LEDs to limit an irradiation region of ultraviolet light emitted by the plurality of ultraviolet LEDs.

公开(公告)号：US11804367B2

公开(公告)日：2023-10-31

申请号：US17221891

申请日：2021-04-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok Hwan Bae ,  Dong Hoon Kim ,  Byeong Sang Kim ,  Hak Young Kim ,  Hee Won Min

IPC: H01J37/32 ,  H01L21/687 ,  H01L21/683

CPC classification number: H01J37/32642 ,  H01J37/32633 ,  H01J37/32715 ,  H01L21/6833 ,  H01L21/68735 ,  H01J2237/0206 ,  H01J2237/2007 ,  H01J2237/334

Abstract: Provided is plasma processing equipment comprising a substrate support, a focus ring disposed along an edge of the upper surface of the substrate support and including a fluid hole passing through a main body, an insulating ring surrounding an outer sidewall of the substrate support and including an inner side surface facing the outer sidewall of the substrate support, an outer side surface, and an upper surface connecting the inner and outer side surfaces, and including upper and lower end portions having different heights, and a connection end portion connecting the upper and lower end portions, a liner surrounding the outer side surface of the insulating ring and a baffle disposed on an upper surface of the liner, wherein a fluid passing through the fluid hole flows along the upper surface, and the baffle generates a pressure difference of the fluid between the upper and lower end portions.