Abstract:
A method of designing a semiconductor device and system for designing a semiconductor device are provided. The method of designing a semiconductor device includes providing a standard cell layout which includes an active region and a dummy region; determining a first fin pitch between a first active fin and a second active fin in the active region and a second fin pitch between a first dummy fin and a second dummy fin in the dummy region; placing the first and second active fins in the active region and the first and second dummy fins in the dummy region using the first and second fin pitches; and verifying the standard cell layout.
Abstract:
In a sense amplifier, a switching transistor is configured to apply a ground voltage to a ground node in response to a sense enable signal. A first detection circuit is configured to output a first detection signal to the first detection node based on a mode signal and a voltage of a bit-line. A second detection circuit is configured to output a second detection signal to the second detection node based on a voltage of a complementary bit-line. A latch circuit is connected to a supply voltage, the first detection node and the second detection node, and configured to output a first amplified signal and a second amplified signal through a latch node and a complementary latch node, respectively, based on the first detection signal and the second detection signal.
Abstract:
A layout design system for designing a semiconductor device includes a processor, a storage module storing an intermediate design, and a correction module used by the processor to correct the intermediate design. The intermediate design includes an active region and dummy designs on the active region. Each dummy design includes a dummy structure and dummy spacers disposed at opposite sides of the dummy structure. The correction module is configured to alter widths of regions of at least some of the dummy designs. The corrected design is used to produce a semiconductor device having an active fin, a hard mask layer disposed on the active fin, a gate structure crossing the over the hard mask layer, and a spacer disposed on at least one side of the gate structure. The hard mask layer, and the active fin, are provided with widths that vary due to the dummy designs.