公开(公告)号：US20240278437A1

公开(公告)日：2024-08-22

申请号：US18413491

申请日：2024-01-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyeon Dong SONG ,  Jun Young MOON ,  Sang Woo PARK ,  Un Ki JEONG ,  Ji Ho UH ,  Hyun Soo CHUN

IPC: B25J13/08 ,  B25J9/02 ,  B25J9/16 ,  B25J11/00

CPC classification number: B25J13/089 ,  B25J9/02 ,  B25J9/1682 ,  B25J11/0095

Abstract: A substrate processing apparatus includes a body which includes an upper face and side faces, and extends in a first direction, a plurality of robot arms which are installed on the upper face of the body, extend in the first direction, are spaced apart from each other in a second direction perpendicular to the upper face of the body, and are able to grip a wafer, and an alignment jig (JIG) which is installed on the upper face and side faces of the body, and senses positions of the plurality of robot arms, wherein the alignment jig includes, a horizontal frame disposed on the upper face of the body, a vertical frame disposed on the side faces of the body, and a displacement sensor installed on the horizontal frame and the vertical frame to sense coordinates of upper faces of the plurality of robot arms and side faces of the plurality of robot arms, the displacement sensor includes a first sensor and a second sensor which are spaced apart from side faces of the plurality of robot arms in a third direction perpendicular to the first and second directions and spaced apart from each other in the first direction, and an upper face of the displacement sensor is disposed at a vertical level higher than vertical levels of the upper faces of each of the plurality of robot arms.

公开(公告)号：US20200206870A1

公开(公告)日：2020-07-02

申请号：US16517849

申请日：2019-07-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eun Seok LEE ,  Ja Eung KOO ,  Kuen Byul KIM ,  Jeong Min NA ,  Chang Gil RYU ,  Hyeon Dong SONG ,  Young Seok JANG ,  Jin Suk HONG

IPC: B24B53/017 ,  B24B57/02 ,  B24D13/14

Abstract: A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.