公开(公告)号：US20210092825A1

公开(公告)日：2021-03-25

申请号：US16861595

申请日：2020-04-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： In Ho CHOI ,  Min Seok Choi ,  Jeong-Gil Kim ,  Hyuck Shin ,  In Jae Lee ,  Sung Ho Jang

IPC: H05G2/00

Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.

公开(公告)号：US11676263B2

公开(公告)日：2023-06-13

申请号：US17529403

申请日：2021-11-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dong-Hyub Lee ,  Kyungsik Kang ,  Jeong-Gil Kim ,  Jinyong Kim ,  Hochul Kim ,  Yozo Matsuda ,  Youngduk Suh ,  Seungkoo Lee ,  Sungho Jang ,  Yoojin Jeong

IPC: G06T7/00 ,  G02B5/10 ,  G02B5/20 ,  G02B5/08 ,  G01M11/00 ,  G03F7/20 ,  H04N23/56 ,  G02B27/10 ,  G03F7/00

CPC classification number: G06T7/0004 ,  G01M11/005 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/208 ,  G02B27/1013 ,  G03F7/70916 ,  H04N23/56 ,  G06T2207/10152

Abstract: An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.

公开(公告)号：US20220309643A1

公开(公告)日：2022-09-29

申请号：US17529403

申请日：2021-11-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dong-Hyub Lee ,  Kyungsik Kang ,  Jeong-Gil Kim ,  Jinyong Kim ,  Hochul Kim ,  Yozo Matsuda ,  Youngduk Suh ,  Seungkoo Lee ,  Sungho Jang ,  Yoojin Jeong

IPC: G06T7/00 ,  G02B5/10 ,  G02B5/20 ,  G02B27/10 ,  G02B5/08 ,  G01M11/00 ,  H04N5/225 ,  G03F7/20

Abstract: An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.

公开(公告)号：US11109474B2

公开(公告)日：2021-08-31

申请号：US16861595

申请日：2020-04-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： In Ho Choi ,  Min Seok Choi ,  Jeong-Gil Kim ,  Hyuck Shin ,  In Jae Lee ,  Sung Ho Jang

IPC: H05G2/00

Abstract: An extreme ultraviolet generation apparatus is provided. The extreme ultraviolet generation apparatus includes a chamber, a droplet generator configured to provide a droplet into the chamber, a shroud which extends along a movement path of the droplet inside the chamber and surrounds the movement path of the droplet, a charging unit configured to charge the droplet, a monitoring unit configured to measure a position of the charged droplet, an alignment unit including at least one electromagnet, the alignment unit configured to correct the position of the charged droplet within the shroud using the at least one electromagnet, and an acceleration unit configured to accelerate the charged droplet after the position of the charged droplet has been corrected.