公开(公告)号：US09891537B2

公开(公告)日：2018-02-13

申请号：US15348173

申请日：2016-11-10

申请人： Samsung Electronics Co., Ltd.

发明人： Ji Young Chu ,  Shiva Ram Krishna ,  Tae Hyun Kim ,  Song Woo Bae ,  Sang Don Jang ,  Won Don Joo

IPC分类号： G03F7/20

CPC分类号： G03F7/70391 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/7085

摘要： Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.