Abstract:
A substrate analysis system includes a load-lock module configured to load or unload a substrate on which a pattern layer is formed; a milling module configured to form a milling surface from which at least a portion of the pattern layer is removed; a depth measuring module configured to measure a milling depth of an analysis region formed on the milling surface; an imaging module configured to capture a two-dimensional image of the analysis region; and a control module controlling the substrate to circulate through the milling module, the depth measuring module, and the imaging module, when the milling depth is shallower than a set target depth, wherein the milling module adjusts a path of the ion beam so that the ion beam moves horizontally in the milling region according to a scanning profile received based on an intensity map of the ion beam.
Abstract:
An electronic device is provided. The electronic device includes a communication module, a memory configured to store multiple recognition algorithms for analyzing user activities, and a processor configured to acquire activity schedule information related to a user activity; select at least one recognition algorithm among the multiple recognition algorithms, at least based on the acquired activity schedule information; and analyze activity information related to the user activity, using the at least one recognition algorithm, thereby providing activity guide information related to the user activity.