公开(公告)号：US20160139500A1

公开(公告)日：2016-05-19

申请号：US14736706

申请日：2015-06-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Munja KIM ,  Byunggook KIM ,  Jaehyuck CHOI

IPC: G03F1/62

CPC classification number: G03F1/62 ,  G03F1/64

Abstract: Provided is a method of manufacturing a pellicle. The method includes preparing a substrate, forming a membrane on the substrate by performing a chemical vapor deposition (CVD) process, separating the membrane from the substrate in a first solvent, rinsing the separated membrane in a second solvent, and transferring the separated membrane to a frame in a third solvent.

Abstract translation: 提供一种制造防护薄膜组件的方法。 该方法包括制备基材，通过进行化学气相沉积（CVD）工艺在基板上形成膜，在第一溶剂中将膜与基板分离，在第二溶剂中冲洗分离的膜，并将分离的膜转移到 在第三溶剂中的框架。

公开(公告)号：US20180203346A1

公开(公告)日：2018-07-19

申请号：US15919653

申请日：2018-03-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwanchul JEON ,  Munja KIM ,  Sungwon KWON ,  Byunggook KIM ,  Roman CHALYKH ,  Yongseok JUNG ,  Jaehyuck CHOI

IPC: G03F1/64 ,  G03F1/62

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.

公开(公告)号：US20160195804A1

公开(公告)日：2016-07-07

申请号：US14972258

申请日：2015-12-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Munja KIM ,  Ji-Beom YOO ,  Sooyoung KIM ,  Taesung KIM ,  Dong-Wook SHIN ,  Hwanchul JEON ,  Seul-Gi KIM

IPC: G03F1/64 ,  C23C16/44

CPC classification number: G03F1/62 ,  C23C16/26

Abstract: The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.

Abstract translation: 该方法包括在基底上形成石墨层，在石墨层上形成支撑层，形成石墨层和支撑层的叠层，去除衬底以将堆叠与衬底分离，转移石墨层的堆叠 和支撑层到框架上，并且从框架移除支撑层。