公开(公告)号：US09612528B2

公开(公告)日：2017-04-04

申请号：US14736706

申请日：2015-06-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Munja Kim ,  Byunggook Kim ,  Jaehyuck Choi

IPC: G03F1/62 ,  G03F1/64

CPC classification number: G03F1/62 ,  G03F1/64

Abstract: Provided is a method of manufacturing a pellicle. The method includes preparing a substrate, forming a membrane on the substrate by performing a chemical vapor deposition (CVD) process, separating the membrane from the substrate in a first solvent, rinsing the separated membrane in a second solvent, and transferring the separated membrane to a frame in a third solvent.

公开(公告)号：US09753367B2

公开(公告)日：2017-09-05

申请号：US14972258

申请日：2015-12-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Munja Kim ,  Ji-Beom Yoo ,  Sooyoung Kim ,  Taesung Kim ,  Dong-Wook Shin ,  Hwanchul Jeon ,  Seul-Gi Kim

IPC: G03F1/64 ,  G03F1/62 ,  C23C16/26

CPC classification number: G03F1/62 ,  C23C16/26

Abstract: The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.

公开(公告)号：US20250068050A1

公开(公告)日：2025-02-27

申请号：US18678622

申请日：2024-05-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Munja Kim ,  Jongju Park ,  Byunghoon Lee ,  Yunhan Lee

IPC: G03F1/24

Abstract: A photomask assembly includes a mask pattern providing an upper surface and including a plurality of pins extending in a vertical direction with respect to the upper surface, a pellicle membrane disposed to be spaced apart from the mask pattern in the vertical direction, and a frame assembly configured to support the pellicle membrane, wherein the frame assembly includes a frame body having a plurality of pin holes configured to respectively fasten the plurality of pins, a first magnetic member configured to surround the plurality of pin holes inside the frame body and generate an attractive force on the plurality of pins, and a second magnetic member disposed in a lower portion of the frame body and configured to generate an attractive force on the upper surface of the mask pattern.

公开(公告)号：US10274820B2

公开(公告)日：2019-04-30

申请号：US15919653

申请日：2018-03-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwanchul Jeon ,  Munja Kim ,  Sungwon Kwon ,  Byunggook Kim ,  Roman Chalykh ,  Yongseok Jung ,  Jaehyuck Choi

IPC: G03F1/62 ,  G03F1/64

Abstract: A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.