公开(公告)号：US20230417820A1

公开(公告)日：2023-12-28

申请号：US18134731

申请日：2023-04-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Martin Priwisch ,  Alexander Michalski ,  Michael Nagel ,  Namil Koo ,  Suhwan Park ,  Junbum Park ,  Inkeun Baek ,  Jongmin Yoon ,  Yoonkyung Jang ,  Ikseon Jeon

IPC: G01R31/265 ,  G01R1/07

CPC classification number: G01R31/2656 ,  G01R1/07

Abstract: According to embodiments, a cantilever is provided. The cantilever includes a first conductive line, a second conductive line, and a third conductive line extending on the substrate, a microtip arranged on the substrate, and an emitter antenna arranged on the microtip, connected to the first to third conductive lines, and configured to produce a scattering signal of a terahertz wave band, wherein the emitter antenna includes a first emitter electrode connected to the first conductive line, a second emitter electrode connected to the second conductive line and adjacent to the first emitter electrode, a third emitter electrode connected to the third conductive line and spaced apart from the first emitter electrode with the second emitter electrode in-between, and a scattering part connecting the first and second emitter electrodes with each other.

公开(公告)号：US20240399506A1

公开(公告)日：2024-12-05

申请号：US18545864

申请日：2023-12-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sang Min Lee ,  Seongpyo Hong ,  Sangwoo Bae ,  Namil Koo

IPC: B23K26/38

Abstract: Embodiments of a substrate processing apparatus and substrate processing method are provided. Embodiments include a laser that directs a laser beam toward a substrate. Embodiments further include a chuck spaced apart in a first direction from the laser. Embodiments include a lower particle blocker disposed between the chuck and the laser. In some cases, the lower particle blocker includes a first particle blocker. In some cases, the first particle blocker includes a first slit that penetrates the first particle blocker in the first direction. In some cases, the first slit extends in a second direction perpendicular to the first direction.

公开(公告)号：US11579168B2

公开(公告)日：2023-02-14

申请号：US17488657

申请日：2021-09-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ikseon Jeon ,  Namil Koo ,  Junbum Park ,  Inkeun Baek

IPC: G01Q60/22 ,  G01Q20/02

Abstract: Provided is a probe configured to detect a near field, the probe including a probe substrate having a tip region at an end portion of the probe substrate, a width of the tip region being less than a width of a remaining region of the probe substrate, a first electrode and a second electrode disposed on a surface of the probe substrate, the first electrode and the second electrode being spaced apart from each other and extending from the tip region along the probe substrate, an emitter and a detector disposed between the first electrode and the second electrode, the emitter and the detector being spaced apart from each other in a direction in which the probe substrate extends, and being configured to be photo switched, and a reflector disposed above the emitter and the detector in the direction in which the probe substrate extends opposite to the tip region, and configured to reflect an electromagnetic wave emitted from the emitter.

公开(公告)号：US20240230528A1

公开(公告)日：2024-07-11

申请号：US18389028

申请日：2023-11-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunhong Jun ,  Inkeun Baek ,  Wontae Kim ,  Namil Koo ,  Ingi Kim ,  Sungyoon Ryu ,  Younghoon Sohn ,  Yusin Yang ,  Ikseon Jeon ,  Eunhyuk Choi

IPC: G01N21/3581 ,  G01N21/95 ,  H01L21/66

CPC classification number: G01N21/3581 ,  G01N21/9501 ,  H01L22/12

Abstract: A measuring apparatus includes a stage including a transmissive wafer chuck on which a sample wafer is provided, where the sample wafer includes a silicon substrate and at least one material layer on the silicon substrate, a light source unit including a light source configured to generate and output a femtosecond laser beam, and a confocal laser-induced terahertz (THz) emission microscopy (LTEM) unit configured to generate multi-photon excitation by splitting the femtosecond laser beam into four sub-laser beams and causing three sub-laser beams among the four sub-laser beams to be incident in an overlapping manner on a measurement position of the sample wafer, where the confocal LTEM unit is configured to generate the multi-photon excitation based on the three sub-laser beams being incident on a lower surface of the silicon substrate.

公开(公告)号：US11688623B2

公开(公告)日：2023-06-27

申请号：US16834132

申请日：2020-03-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Racine Elysia Auxter Nassau ,  Namil Koo ,  Suhwan Park ,  Taeheung Ahn ,  Sangyeon Oh

IPC: H01L21/683 ,  H01L21/687 ,  G01N21/95

CPC classification number: H01L21/6838 ,  G01N21/9501 ,  H01L21/68714

Abstract: A wafer inspection apparatus includes a support structure including a frame and vacuum chucks mounted thereon, each vacuum chuck having a support surface including a vacuum suction portion, the support structure configured to structurally support a wafer on one or more vacuum chucks, the frame defining an opening larger than an area of the wafer. The wafer inspection apparatus includes an electromagnetic wave emitter configured to irradiate an inspection electromagnetic wave to the wafer, a sensor configured to receive the inspection electromagnetic wave from the wafer based on the inspection electromagnetic wave passing through the wafer, and a driver configured to move at least one of the electromagnetic wave emitter or the frame to change an irradiation location of the wafer. Each vacuum chuck is configured to be selectively movable between a first location and a second location in relation to the frame.

公开(公告)号：US12165933B2

公开(公告)日：2024-12-10

申请号：US17180343

申请日：2021-02-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Inkeun Baek ,  Namil Koo ,  Suhwan Park ,  Junbum Park

IPC: H01L21/66 ,  G01N21/95 ,  G01N21/956 ,  H01L21/683

Abstract: A semiconductor substrate processing apparatus includes: a metastructure layer divided into a plurality of microstructures by grooves, a light-transmitting dielectric substrate that supports the plurality of microstructures and is configured to allow an electromagnetic wave to be transmitted therethrough, and a frame including an exhaust hole configured to receive gas introduced from the grooves such as to provide suction force to the semiconductor substrate, wherein each of the plurality of microstructures has a smaller width than a wavelength of the electromagnetic wave, and each of the grooves has a smaller width than the wavelength of the electromagnetic wave.

公开(公告)号：US20240019362A1

公开(公告)日：2024-01-18

申请号：US18220672

申请日：2023-07-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junbum Park ,  Namil Koo ,  Jaeho Kim ,  Jongsu Kim ,  Suhwan Park ,  Sangwoo Bae ,  Inkeun Baek ,  Ikseon Jeon ,  Martin Priwisch

IPC: G01N21/3581 ,  G01N21/956

CPC classification number: G01N21/3581 ,  G01N21/956 ,  G01N2021/95676

Abstract: An inspection apparatus is provided. The inspection apparatus includes a substrate extending in a first direction and a second direction perpendicular to the first direction, a receiver antenna arranged on the substrate and including first and second antenna electrodes, a first waveguide on the substrate, and a second waveguide on the substrate, wherein the first antenna electrode overlaps the first waveguide in a third direction that is perpendicular to the first direction and the second direction, and the second antenna electrode overlaps the second waveguide in the third direction.

公开(公告)号：US11579167B2

公开(公告)日：2023-02-14

申请号：US17333924

申请日：2021-05-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jongmin Yoon ,  Namil Koo ,  Nagel Michael ,  Suhwan Park ,  Junbum Park ,  Inkeun Baek ,  Sion Lee

IPC: G01Q60/22 ,  G01N21/68 ,  H05K9/00

Abstract: A near-field detection system includes include an electric field generator configured to apply an electric field to an analysis sample, a probe configured to detect a near field that has passed through the analysis sample, a current detector connected to the probe, and a laser system irradiating a laser to each of the electric field generator and the probe. The probe includes a cantilever substrate, an antenna electrode on the cantilever substrate, an electromagnetic wave blocking layer exposing a sensing region of the cantilever substrate, the electromagnetic wave blocking layer including a conductive material, and an insulating layer interposed between the cantilever substrate and the electromagnetic wave blocking layer such that the insulating layer is between the antenna electrode and the electromagnetic wave blocking layer.

公开(公告)号：US11680898B2

公开(公告)日：2023-06-20

申请号：US17183577

申请日：2021-02-24

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Junbum Park ,  Namil Koo ,  Inkeun Baek ,  Jongmin Yoon

IPC: G01N21/3581 ,  H01Q23/00 ,  H01Q19/10 ,  H01Q21/06 ,  H01Q1/52 ,  G01N21/3563

CPC classification number: G01N21/3581 ,  G01N21/3563 ,  H01Q1/525 ,  H01Q19/108 ,  H01Q21/062 ,  H01Q23/00 ,  G01N2021/3568 ,  G01N2201/061

Abstract: A hybrid probe includes a probe body including a wiring and extending in a first direction; and a probe tip coupled to the probe body and including a first antenna, a second antenna, and an isolation layer. The hybrid probe may operate in a reflection mode using the first antenna and the second antenna, and operate in a transmission mode using the second antenna.

公开(公告)号：US20220155340A1

公开(公告)日：2022-05-19

申请号：US17488657

申请日：2021-09-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ikseon Jeon ,  Namil Koo ,  Junbum Park ,  Inkeun Baek

IPC: G01Q60/22 ,  G01Q20/02

Abstract: Provided is a probe configured to detect a near field, the probe including a probe substrate having a tip region at an end portion of the probe substrate, a width of the tip region being less than a width of a remaining region of the probe substrate, a first electrode and a second electrode disposed on a surface of the probe substrate, the first electrode and the second electrode being spaced apart from each other and extending from the tip region along the probe substrate, an emitter and a detector disposed between the first electrode and the second electrode, the emitter and the detector being spaced apart from each other in a direction in which the probe substrate extends, and being configured to be photo switched, and a reflector disposed above the emitter and the detector in the direction in which the probe substrate extends opposite to the tip region, and configured to reflect an electromagnetic wave emitted from the emitter.