APPARATUS AND METHOD MONITORING SEMICONDUCTOR MANUFACTURING EQUIPMENT

    公开(公告)号:US20240128102A1

    公开(公告)日:2024-04-18

    申请号:US18125853

    申请日:2023-03-24

    CPC classification number: H01L21/67259 G01B11/0608

    Abstract: An apparatus monitoring semiconductor manufacturing equipment includes; an optical detector, a light generator generating light along a first optical path towards a semiconductor substrate, wherein upon irradiating the semiconductor substrate, the light becomes reflected light along a second optical path away from the semiconductor substrate and towards the optical detector, a first grating reticle between the light generator and the semiconductor substrate and including first slits having a first pitch and second slits having a second pitch different from the first pitch, a second grating reticle between the semiconductor substrate and the optical detector and including third slits having a third pitch different from the first pitch and the second pitch, wherein the optical detector determines a positional attribute of the semiconductor substrate in relation to a first pattern and a second pattern, the first pattern corresponds to a first portion of light/reflected light sequentially passing through the first slits and the third slits, and the second pattern corresponds to a second portion of light/reflected light sequentially passing through the second slits and the third slits.

    OPTICAL APPARATUS AND MANUFACTURING METHOD USING THE SAME
    2.
    发明申请
    OPTICAL APPARATUS AND MANUFACTURING METHOD USING THE SAME 有权
    使用它的光学装置和制造方法

    公开(公告)号:US20160097981A1

    公开(公告)日:2016-04-07

    申请号:US14867292

    申请日:2015-09-28

    CPC classification number: G03F7/16 G03F7/70383 G03F7/70791 G03F7/7085

    Abstract: An optical apparatus and a manufacturing method using the optical apparatus are disclosed. The optical apparatus includes a stage supporting a substrate, first optical systems providing a first light onto the substrate, a gantry supporting the first optical systems to transfer them on the stage, and second optical systems disposed between the gantry and the stage and detecting displacement of the first optical systems. Each of the second optical systems includes a beam source generating a second light different with the first light, and sensor arrays for sensing the second light provided to the first optical systems to detect displacement of the first optical systems.

    Abstract translation: 公开了一种使用该光学装置的光学装置和制造方法。 光学装置包括支撑基板的台,在基板上提供第一光的第一光学系统,支撑第一光学系统以将它们传送到台上的台架,以及设置在台架与台之间的第二光学系统, 第一个光学系统。 每个第二光学系统包括产生与第一光不同的第二光的光束源和用于感测提供给第一光学系统的第二光以检测第一光学系统的位移的传感器阵列。

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