公开(公告)号：US20210305106A1

公开(公告)日：2021-09-30

申请号：US17021087

申请日：2020-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： EUNHEE JEANG ,  BORIS AFINOGENOV ,  SANGWOO BAE ,  WONDON JOO ,  MAKSIM RIABKO ,  ANTON MEDVEDEV ,  ALEKSANDR SHOROKHOV ,  ANTON SOFRONOV ,  INGI KIM ,  TAEHYUN KIM ,  MINHWAN SEO ,  SANGMIN LEE ,  SEULGI LEE

IPC: H01L21/66 ,  H01L21/67 ,  G01N21/64 ,  G01N21/95

Abstract: A substrate inspection apparatus includes a light source unit, a pulsed beam matching unit, a substrate support unit, an incidence angle adjusting unit, and a detecting unit. The light source unit emits a first laser beam having a first wavelength and a second laser beam having a second wavelength. The pulsed beam matching unit matches the first laser beam and the second laser beam to superimpose a pulse of the first laser beam on a pulse of the second laser beam in time and space. The substrate support unit supports a substrate to be inspected. The incidence angle adjusting unit adjusts angles of incidence of the matched first laser beam and second laser beams to irradiate the first laser beam and the second laser beam on the substrate, and mixes the first laser beam and the second laser beam to generate an evanescent wave on the substrate. The evanescent wave generates scattered light due to a defect of the substrate. The detecting unit detects the scattered light generated due to the defect of the substrate.

公开(公告)号：US20240145315A1

公开(公告)日：2024-05-02

申请号：US18495618

申请日：2023-10-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： EUNHEE JEANG ,  BORIS AFINOGENOV ,  SANGWOO BAE ,  WONDON JOO ,  MAKSIM RIABKO ,  ANTON MEDVEDEV ,  ALEKSANDR SHOROKHOV ,  ANTON SOFRONOV ,  INGI KIM ,  TAEHYUN KIM ,  MINHWAN SEO ,  SANGMIN LEE ,  SEULGI LEE

IPC: H01L21/66 ,  G01N21/64 ,  G01N21/95 ,  H01L21/67

CPC classification number: H01L22/12 ,  G01N21/648 ,  G01N21/9505 ,  H01L21/67288 ,  G01N2201/06113

Abstract: A substrate inspection apparatus includes a light source unit, a pulsed beam matching unit, a substrate support unit, an incidence angle adjusting unit, and a detecting unit. The light source unit emits a first laser beam having a first wavelength and a second laser beam having a second wavelength. The pulsed beam matching unit matches the first laser beam and the second laser beam to superimpose a pulse of the first laser beam on a pulse of the second laser beam in time and space. The substrate support unit supports a substrate to be inspected. The incidence angle adjusting unit adjusts angles of incidence of the matched first laser beam and second laser beams to irradiate the first laser beam and the second laser beam on the substrate, and mixes the first laser beam and the second laser beam to generate an evanescent wave on the substrate. The evanescent wave generates scattered light due to a defect of the substrate. The detecting unit detects the scattered light generated due to the defect of the substrate.

公开(公告)号：US20170047509A1

公开(公告)日：2017-02-16

申请号：US15340330

申请日：2016-11-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jongchul Park ,  BYOUNGJAE BAE ,  INHO KIM ,  SHIN KWON ,  EUNSUN NOH ,  INSUN PARK ,  SANGMIN LEE

IPC: H01L43/02 ,  H01L27/22 ,  H01L43/12 ,  H01L43/08 ,  H01L43/10

CPC classification number: H01L43/02 ,  G11C11/161 ,  H01L21/0335 ,  H01L27/228 ,  H01L43/08 ,  H01L43/10 ,  H01L43/12

Abstract: Methods of manufacturing a semiconductor device include forming a conductive layer on a substrate, forming an air gap or other cavity between the conductive layer and the substrate, and patterning the conductive layer to expose the air gap. The methods may further include forming conductive pillars between the substrate and the conductive layer. The air gap may be positioned between the conductive pillars.

Abstract translation: 制造半导体器件的方法包括在衬底上形成导电层，在导电层和衬底之间形成气隙或其它腔，以及图案化导电层以露出气隙。 该方法还可以包括在衬底和导电层之间形成导电柱。 气隙可以位于导电柱之间。

公开(公告)号：US20230047722A1

公开(公告)日：2023-02-16

申请号：US17580708

申请日：2022-01-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SANGMIN LEE ,  SEULGI LEE ,  SUNGWOOK JUNG ,  HYUKJUN KWON ,  HYANGROK LEE

IPC: G02B27/09 ,  G02B27/28 ,  G02B27/10 ,  G02B27/14 ,  G02B3/00 ,  B23K26/00 ,  B23K26/067 ,  B23K26/06

Abstract: A method of operating an apparatus for laser annealing, includes reducing temporal or spatial coherency of a plurality of laser beams by beam superimposing; and reducing an electric field inner product magnitude of beams having the reduced temporal or spatial coherency by a fly eye lens array to reduce coherency, and/or by modifying a polarization state between the beams by beam superimposing.

公开(公告)号：US20240128102A1

公开(公告)日：2024-04-18

申请号：US18125853

申请日：2023-03-24

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SUNGHO JANG ,  HYUNGJIN KIM ,  MINHWAN SEO ,  AKINORI OKUBO ,  SANGMIN LEE ,  SINYONG LEE ,  WONDON JOO ,  SANGJOON HONG

IPC: H01L21/67 ,  G01B11/06

CPC classification number: H01L21/67259 ,  G01B11/0608

Abstract: An apparatus monitoring semiconductor manufacturing equipment includes; an optical detector, a light generator generating light along a first optical path towards a semiconductor substrate, wherein upon irradiating the semiconductor substrate, the light becomes reflected light along a second optical path away from the semiconductor substrate and towards the optical detector, a first grating reticle between the light generator and the semiconductor substrate and including first slits having a first pitch and second slits having a second pitch different from the first pitch, a second grating reticle between the semiconductor substrate and the optical detector and including third slits having a third pitch different from the first pitch and the second pitch, wherein the optical detector determines a positional attribute of the semiconductor substrate in relation to a first pattern and a second pattern, the first pattern corresponds to a first portion of light/reflected light sequentially passing through the first slits and the third slits, and the second pattern corresponds to a second portion of light/reflected light sequentially passing through the second slits and the third slits.

公开(公告)号：US20220398205A1

公开(公告)日：2022-12-15

申请号：US17836829

申请日：2022-06-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： JUNYOUNG MOON ,  SANGMIN LEE

IPC: G06F13/38 ,  G06F13/40 ,  G06F13/42 ,  G06F21/44

Abstract: A host system includes a connector having a structure connected to the device irrespective of a direction. The connector includes a plurality of pins disposed thereon. A connection direction detector is configured to detect a direction in which the device is connected to the host system by detecting a signal from at least one first pin of the plurality of pins. A setting controller is configured to receive, from the device, setting information related to a configuration supported by the device and control a configuration operation on the device based on direction information from the connection direction detection. The host system is configured to perform control such that a function module having a unique function included in the device is selectively enabled based on the setting information and the direction information.