公开(公告)号：US20240264522A1

公开(公告)日：2024-08-08

申请号：US18410463

申请日：2024-01-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yun Song JEONG ,  Jun Hyuk CHANG ,  Sang Yong YU ,  Sang Min KIM ,  Jae Sung BYUN ,  Hyun Woo LEE

IPC: G03F1/66 ,  G03F7/00

CPC classification number: G03F1/66 ,  G03F7/70733 ,  G03F7/70808

Abstract: A mask case includes a lower case including a first side surface and a second side surface opposite each other, a first rail on the first side surface, and a second rail on the second side surface, an upper case separable from the lower case, and includes third and fourth side surfaces corresponding to the first and second side surfaces, a third rail on the third side, and a fourth rail on the fourth side, a first sliding lock member slidable along the first and third rails, and a second sliding lock member slidable along the second and fourth rails, first and second holes for coupling first and second pins of first and second locking open and close devices are in the first and second sliding lock members, and the first and second sliding lock members are slid by the first and second locking open and close devices.

公开(公告)号：US20150102236A1

公开(公告)日：2015-04-16

申请号：US14446736

申请日：2014-07-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Yong YU ,  Sang Hee LEE ,  Seong Yong MOON

IPC: H01J37/302 ,  H01J37/20 ,  H01J37/317

CPC classification number: G03F7/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/24514 ,  H01J2237/24542 ,  H01J2237/24564 ,  H01J2237/30433 ,  H01J2237/30455 ,  H01J2237/31774 ,  H01J2237/31776 ,  H01J2237/31798

Abstract: An electron beam exposure apparatus includes an electron beam source, a stage, and an error detection device. The electron beam source radiates a first electron beam corresponding to first input data and a second electron beam corresponding to second input data. The stage includes a mask on which the first electron beam is radiated. The stage may be configured to move the mask. The error detection device detects an error of the second electron beam and outputs error detection information.

Abstract translation: 电子束曝光装置包括电子束源，载物台和错误检测装置。 电子束源辐射对应于第一输入数据的第一电子束和对应于第二输入数据的第二电子束。 舞台包括辐射第一电子束的掩模。 舞台可配置为移动面罩。 误差检测装置检测第二电子束的误差并输出错误检测信息。