公开(公告)号：US20250056843A1

公开(公告)日：2025-02-13

申请号：US18438920

申请日：2024-02-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jong Min SHIN ,  Heon Jong SHIN ,  June Young PARK ,  Jae Ran JANG ,  Sang Hee LEE ,  Kerm RIM ,  Sung Gyu HAN

IPC: H01L29/786 ,  H01L21/8234 ,  H01L23/48 ,  H01L23/528 ,  H01L27/088 ,  H01L29/06 ,  H01L29/08 ,  H01L29/423 ,  H01L29/66 ,  H01L29/775

Abstract: A semiconductor device includes: a lower interlayer insulating layer; first and second active patterns on the lower interlayer insulating layer; a gate electrode on the first and second active patterns; a first source region on a first side of the gate electrode; a second source region on a second side of the gate electrode; a third source region on the first side of the gate electrode; a drain region on the second side of the gate electrode; a first contact adjacent to the gate electrode, and connected to the first and third source regions; a second contact adjacent to the gate electrode, and connected to the second source region; a third contact adjacent to the gate electrode, and connected to the drain region; a lower wiring layer inside the lower interlayer insulating layer; and a through via connecting the lower wiring layer with the first contact.

公开(公告)号：US20150102236A1

公开(公告)日：2015-04-16

申请号：US14446736

申请日：2014-07-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang Yong YU ,  Sang Hee LEE ,  Seong Yong MOON

IPC: H01J37/302 ,  H01J37/20 ,  H01J37/317

CPC classification number: G03F7/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/24514 ,  H01J2237/24542 ,  H01J2237/24564 ,  H01J2237/30433 ,  H01J2237/30455 ,  H01J2237/31774 ,  H01J2237/31776 ,  H01J2237/31798

Abstract: An electron beam exposure apparatus includes an electron beam source, a stage, and an error detection device. The electron beam source radiates a first electron beam corresponding to first input data and a second electron beam corresponding to second input data. The stage includes a mask on which the first electron beam is radiated. The stage may be configured to move the mask. The error detection device detects an error of the second electron beam and outputs error detection information.

Abstract translation: 电子束曝光装置包括电子束源，载物台和错误检测装置。 电子束源辐射对应于第一输入数据的第一电子束和对应于第二输入数据的第二电子束。 舞台包括辐射第一电子束的掩模。 舞台可配置为移动面罩。 误差检测装置检测第二电子束的误差并输出错误检测信息。