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公开(公告)号:US10669631B2
公开(公告)日:2020-06-02
申请号:US16031349
申请日:2018-07-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ki-Chul Kim , Jung-Il Ahn , Jung-Hun Seo , Jong-Cheol Lee , Kyu-Hee Han , Seung-Han Lee , Jin-Pil Heo
IPC: C23C16/40 , C23C16/455 , C23C16/44
Abstract: A gas injection apparatus, which can sequentially supply a substrate with at least two kinds of source gases reacting with each other in a container, and thin film deposition equipment including the gas injection apparatus, are provided. The gas injection apparatus includes a base plate, a first gas supply region protruding from the base plate, a second gas supply region protruding from the base plate and adjacent the first gas supply region, and a trench defined by a sidewall of the first gas supply region and a sidewall of the second gas supply region. The sidewall of the first gas supply region and the sidewall of the second gas supply region face each other and extend in a radial direction on the base plate.
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公开(公告)号:US20180320267A1
公开(公告)日:2018-11-08
申请号:US16031349
申请日:2018-07-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ki-Chul Kim , Jung-Il Ahn , Jung-Hun Seo , Jong-Cheol Lee , Kyu-Hee Han , Seung-Han Lee , Jin-Pil Heo
IPC: C23C16/455 , C23C16/44
CPC classification number: C23C16/45574 , C23C16/4412 , C23C16/45519 , C23C16/45551 , C23C16/45565
Abstract: A gas injection apparatus, which can sequentially supply a substrate with at least two kinds of source gases reacting with each other in a container, and thin film deposition equipment including the gas injection apparatus, are provided. The gas injection apparatus includes a base plate, a first gas supply region protruding from the base plate, a second gas supply region protruding from the base plate and adjacent the first gas supply region, and a trench defined by a sidewall of the first gas supply region and a sidewall of the second gas supply region. The sidewall of the first gas supply region and the sidewall of the second gas supply region face each other and extend in a radial direction on the base plate.
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