公开(公告)号：US20230317439A1

公开(公告)日：2023-10-05

申请号：US18203864

申请日：2023-05-31

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Meehyun LIM ,  Sungyeol KIM ,  Taekjin KIM ,  Minsung KIM ,  Hosun YOO

IPC分类号： H01J37/32 ,  G02F1/035

CPC分类号： H01J37/32935 ,  G02F1/035 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32642 ,  H01J2237/334

摘要： An apparatus for monitoring a plasma process may include an electro-optical (EO) sensor module and an optical guide, the EO sensor module may be arranged in a plasma chamber configured to perform a semiconductor process for processing a substrate using plasma, the EO sensor module may include a non-conductive material having an optical refractive index changed by an electric field formed in the plasma chamber, the optical guide may form at least one internal path of a light, which may have an optical characteristic changed by the changed optical refractive index, between the EO sensor module and the plasma chamber.

公开(公告)号：US20240274661A1

公开(公告)日：2024-08-15

申请号：US18507606

申请日：2023-11-13

申请人： Samsung Electronics Co., Ltd.

发明人： Sungyoung YOON ,  Jonghwa SHIN ,  Minyeul LEE ,  Sungyeol KIM ,  Taekjin KIM ,  Meehyun LIM ,  Sungyong LIM

IPC分类号： H01L29/06

CPC分类号： H01L29/0657 ,  H01L29/0692

摘要： A dielectric structure may include: an insulating layer extending in a first direction; a plurality of conductor layers disposed on a first surface of the insulating layer and spaced apart from each other in the first direction; at least one semiconductor layer disposed on a second surface of the insulating layer, opposite to the first surface, and overlapping each of at least two conductor layers adjacent to each other among the plurality of conductor layers in a second direction intersecting the first direction; a first protective layer covering the plurality of conductor layers on the first surface of the insulating layer; and a second protective layer covering the at least one semiconductor layer on the second surface of the insulating layer.