公开(公告)号：US20020158293A1

公开(公告)日：2002-10-31

申请号：US10121666

申请日：2002-04-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byeung-leul Lee ,  Kyu-dong Jung ,  Sang-woo Lee ,  Yong-chul Cho

IPC: H01L027/14 ,  H01L029/82 ,  H01L029/84

CPC classification number: G01P15/18 ,  B81B2203/0136 ,  B81C1/0015 ,  B81C2201/0132 ,  G01C19/5755 ,  G01P15/125 ,  G01P2015/0814 ,  G01P2015/0831

Abstract: Provided are a structure for detecting a vertical displacement and its manufacturing method. The structure for detecting a vertical displacement includes a body, an inertial mass floated over the body, a plurality of support beams extending from the inertial mass so as to suspend the inertial mass over the body, movable electrodes integrally formed with the inertial mass, and fixed electrodes floated over the body, each being positioned between the neighboring movable electrodes, wherein a vertical length of the movable electrode is different from a vertical length of the fixed electrode. Therefore, the structure and the electrodes can be simultaneously manufactured, thereby making the fabrication process simple. Also, it is possible to manufacture a three-axis accelerometer and a three-axis gyroscope on a single wafer by the same process, to be integrated as a six-axis inertial sensor.

Abstract translation: 提供了用于检测垂直位移的结构及其制造方法。 用于检测垂直位移的结构包括主体，悬挂在主体上的惯性质量，从惯性块延伸的多个支撑梁，以将惯性块悬挂在主体上，与惯性块一体形成的可动电极，以及 固定电极浮在身体上，每个固定电极位于相邻的可移动电极之间，其中可移动电极的垂直长度不同于固定电极的垂直长度。 因此，可以同时制造结构和电极，从而使制造工艺简单。 另外，可以通过相同的工艺在单个晶片上制造三轴加速度计和三轴陀螺仪，作为六轴惯性传感器集成。