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公开(公告)号:US20200176375A1
公开(公告)日:2020-06-04
申请号:US16784900
申请日:2020-02-07
Applicant: Samsung Electronics Co., Ltd.
Inventor: Young-jin Jung , Joon-hee Lee
IPC: H01L23/528 , H01L27/11582 , H01L27/11556 , H01L27/11565 , H01L27/1157
Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.
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公开(公告)号:US10811356B2
公开(公告)日:2020-10-20
申请号:US16784900
申请日:2020-02-07
Applicant: Samsung Electronics Co., Ltd.
Inventor: Young-jin Jung , Joon-hee Lee
IPC: H01L23/00 , H01L23/528 , H01L27/11582 , H01L27/11556 , H01L27/11565 , H01L27/1157
Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.
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公开(公告)号:US10586766B2
公开(公告)日:2020-03-10
申请号:US16410266
申请日:2019-05-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Young-jin Jung , Joon-hee Lee
IPC: H01L23/52 , H01L23/528 , H01L27/11582 , H01L27/11556 , H01L27/11565 , H01L27/1157
Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.
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公开(公告)号:US11133327B2
公开(公告)日:2021-09-28
申请号:US16383855
申请日:2019-04-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Young-jin Jung , Hyoung-ryeol In , Sung-han Cho
IPC: H01L27/11582 , H01L23/535 , H01L29/10
Abstract: A three-dimensional semiconductor device includes: a common source line passing between a first channel structure and a second channel structure and between a first dummy channel structure and a second dummy channel structure, in which a distance in a first direction between the common source line and the first channel structure is equal to a distance in the first direction between the common source line and the second channel structure, and a distance in the first direction between the common source line and the first dummy channel structure is different from a distance in the first direction between the common source line and the second dummy channel structure.
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公开(公告)号:US20190267321A1
公开(公告)日:2019-08-29
申请号:US16410266
申请日:2019-05-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Young-jin Jung , Joon-hee LEE
IPC: H01L23/528 , H01L27/11582 , H01L27/11565 , H01L27/1157 , H01L27/11556
Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.
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公开(公告)号:US10312191B2
公开(公告)日:2019-06-04
申请号:US15923737
申请日:2018-03-16
Applicant: Samsung Electronics Co., Ltd.
Inventor: Young-jin Jung , Joon-hee Lee
IPC: H01L23/528 , H01L27/11582 , H01L27/11556
Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality or bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.
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