INTEGRATED CIRCUIT DEVICES INCLUDING A VERTICAL MEMORY DEVICE

    公开(公告)号:US20200176375A1

    公开(公告)日:2020-06-04

    申请号:US16784900

    申请日:2020-02-07

    Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.

    Integrated circuit devices including a vertical memory device

    公开(公告)号:US10811356B2

    公开(公告)日:2020-10-20

    申请号:US16784900

    申请日:2020-02-07

    Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.

    Integrated circuit devices including a vertical memory device

    公开(公告)号:US10586766B2

    公开(公告)日:2020-03-10

    申请号:US16410266

    申请日:2019-05-13

    Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.

    Three-dimensional semiconductor device

    公开(公告)号:US11133327B2

    公开(公告)日:2021-09-28

    申请号:US16383855

    申请日:2019-04-15

    Abstract: A three-dimensional semiconductor device includes: a common source line passing between a first channel structure and a second channel structure and between a first dummy channel structure and a second dummy channel structure, in which a distance in a first direction between the common source line and the first channel structure is equal to a distance in the first direction between the common source line and the second channel structure, and a distance in the first direction between the common source line and the first dummy channel structure is different from a distance in the first direction between the common source line and the second dummy channel structure.

    INTEGRATED CIRCUIT DEVICES INCLUDING A VERTICAL MEMORY DEVICE

    公开(公告)号:US20190267321A1

    公开(公告)日:2019-08-29

    申请号:US16410266

    申请日:2019-05-13

    Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality of bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.

    Integrated circuit devices including a vertical memory device

    公开(公告)号:US10312191B2

    公开(公告)日:2019-06-04

    申请号:US15923737

    申请日:2018-03-16

    Abstract: Provided is an integrated circuit device including a plurality of word lines overlapping each other, in a vertical direction, on a substrate, a plurality of channel structures extending in the vertical direction through the plurality of word lines on an area of the substrate, a plurality of bit line contact pads on the plurality of channel structures, and a plurality or bit lines, wherein the plurality of bit lines include a plurality of first bit lines extending parallel to each other at a first pitch in a center region of the area, and a plurality of second bit lines extending at a second pitch in an edge region of the area, the second pitch being different from the first pitch.

Patent Agency Ranking