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    Lens positioning unit of optical system
    1.
    发明授权
    Lens positioning unit of optical system 有权
    光学系统镜头定位单元

    公开(公告)号：US08654461B2

    公开(公告)日：2014-02-18

    申请号：US13298502

    申请日：2011-11-17

    申请人： Sang Hyun Park ,  In Bae Jang

    发明人： Sang Hyun Park ,  In Bae Jang

    IPC分类号： G02B7/02

    CPC分类号： G02B7/023 ,  G02B7/026

    摘要： According to example embodiments, a lens positioning unit includes a fixed structure, a monolithic flexure hinge structure, any one of upper and lower portions of which is provided with a lens mount on which a lens is mounted and the other portion of which is secured to the fixed structure, and an input unit rotatably coupled to the fixed structure, the input unit serving to convert rotational motion into vertical translational motion so as to transmit the vertical translational motion to the upper or lower portion of the monolithic flexure hinge structure provided with the lens mount.

    摘要翻译： 根据示例性实施例，透镜定位单元包括固定结构，单片弯曲铰链结构，其上部和下部中的任何一个设置有透镜座，透镜安装在其上，其另一部分固定到 所述固定结构和可旋转地联接到所述固定结构的输入单元，所述输入单元用于将旋转运动转换成垂直平移运动，以便将所述垂直平移运动传递到所述整体式弯曲铰链结构的上部或下部， 镜头座。

    Position Arrangement Device And Joint Module Thereof
    2.
    发明申请
    Position Arrangement Device And Joint Module Thereof 有权
    位置排列装置及其联合模块

    公开(公告)号：US20120148338A1

    公开(公告)日：2012-06-14

    申请号：US13309898

    申请日：2011-12-02

    申请人： Sang Joon Hong ,  In Bae Jang ,  Sang Hyun Park ,  Ho Seok Choi

    发明人： Sang Joon Hong ,  In Bae Jang ,  Sang Hyun Park ,  Ho Seok Choi

    IPC分类号： F16B1/00

    CPC分类号： G02B7/00 ,  Y10T403/45

    摘要： According to an example embodiment, a position arrangement device includes at least one joint module between a first base and a second base. The at least one joint module is configured to adjust a position of the second base relative to the first base based on elastic flexion in the joint module.

    摘要翻译： 根据示例性实施例，位置排列装置包括在第一基座和第二基座之间的至少一个关节模块。 所述至少一个接头模块构造成基于所述接头模块中的弹性弯曲来调节所述第二基座相对于所述第一基座的位置。

    Lens Positioning Unit Of Optical System
    4.
    发明申请
    Lens Positioning Unit Of Optical System 有权
    光学系统镜头定位单元

    公开(公告)号：US20120154936A1

    公开(公告)日：2012-06-21

    申请号：US13298502

    申请日：2011-11-17

    申请人： Sang Hyun Park ,  In Bae Jang

    发明人： Sang Hyun Park ,  In Bae Jang

    IPC分类号： G02B7/02

    CPC分类号： G02B7/023 ,  G02B7/026

    摘要： According to example embodiments, a lens positioning unit includes a fixed structure, a monolithic flexure hinge structure, any one of upper and lower portions of which is provided with a lens mount on which a lens is mounted and the other portion of which is secured to the fixed structure, and an input unit rotatably coupled to the fixed structure, the input unit serving to convert rotational motion into vertical translational motion so as to transmit the vertical translational motion to the upper or lower portion of the monolithic flexure hinge structure provided with the lens mount.

    摘要翻译： 根据示例性实施例，透镜定位单元包括固定结构，单片弯曲铰链结构，其上部和下部中的任何一个设置有透镜座，透镜安装在其上，其另一部分固定到 所述固定结构和可旋转地联接到所述固定结构的输入单元，所述输入单元用于将旋转运动转换成垂直平移运动，以便将所述垂直平移运动传递到所述整体式弯曲铰链结构的上部或下部， 镜头座。

    STAGE APPARATUS
    6.
    发明申请
    STAGE APPARATUS 审中-公开
    阶段装置

    公开(公告)号：US20130016361A1

    公开(公告)日：2013-01-17

    申请号：US13547387

    申请日：2012-07-12

    申请人： Sang Wook Park ,  In Bae Jang ,  Sang Don Jang ,  Oui Serg Kim

    发明人： Sang Wook Park ,  In Bae Jang ,  Sang Don Jang ,  Oui Serg Kim

    IPC分类号： G01B11/14

    CPC分类号： G01B5/0004 ,  G01B11/002

    摘要： The stage apparatus includes a stage having a range of movement on a stage base, an interferometer and a fixed mirror that are installed outside the stage on the stage base, and a first movable mirror disposed on the stage to reflect light, which is introduced from the interferometer, toward the fixed mirror, and to reflect the light, which is received after being reflected by the fixed mirror, to the interferometer.

    摘要翻译： 舞台装置包括：舞台基座上的移动范围，安装在舞台基座的舞台外部的干涉仪和固定镜;以及设置在舞台上以反射光的第一可移动镜，其从 干涉仪朝向固定镜，并且将被固定镜反射后接收的光反射到干涉仪。

    Exposure apparatuses
    7.
    发明申请
    Exposure apparatuses 审中-公开
    曝光装置

    公开(公告)号：US20100195065A1

    公开(公告)日：2010-08-05

    申请号：US12656171

    申请日：2010-01-20

    申请人： Sang Joon Hong ,  In Bae Jang ,  Oui Serg Kim ,  Sung Jin Lee

    发明人： Sang Joon Hong ,  In Bae Jang ,  Oui Serg Kim ,  Sung Jin Lee

    IPC分类号： G03B27/00

    CPC分类号： G03B27/00 ,  G03F7/70408

    摘要： An exposure apparatus may include a light source generating light; a hologram mask, on which a hologram pattern is formed; and an optical unit movably disposed on the hologram mask to guide the light generated from the light source to the hologram mask. An exposure apparatus may include a light source generating light; a hologram mask, on which a hologram pattern is formed; a prism, separated from the hologram mask, such that one surface of the prism is disposed opposite the hologram mask; and a water supply device to supply water to a space between the prism and the hologram mask.

    摘要翻译： 曝光装置可以包括产生光的光源; 全息图掩模，其上形成全息图图案; 以及可移动地设置在全息掩模上以将从光源产生的光引导到全息掩模的光学单元。 曝光装置可以包括产生光的光源; 全息图掩模，其上形成全息图图案; 与全息掩模分离的棱镜，使得棱镜的一个表面与全息掩模相对设置; 以及向棱镜和全息掩模之间的空间供水的供水装置。

    Holographic exposure apparatuses
    8.
    发明申请
    Holographic exposure apparatuses 审中-公开
    全息曝光装置

    公开(公告)号：US20100208316A1

    公开(公告)日：2010-08-19

    申请号：US12656293

    申请日：2010-01-25

    申请人： Oui Serg Kim ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park ,  In Bae Jang

    发明人： Oui Serg Kim ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park ,  In Bae Jang

    IPC分类号： G03H1/20 ,  G03B27/58

    CPC分类号： G03H1/22 ,  G03F7/70408 ,  G03H1/0408 ,  G03H2001/0094

    摘要： A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a driving unit disposed between the body and mask stage. A holographic exposure apparatus may include an object supported by a substrate stage, a holographic mask spaced apart from the object and supported by a mask stage, a main body supported by the mask stage, and a driving unit disposed between the mask stage and body to control a gap between the mask stage and body. A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a piezoelectric element disposed between the body and mask stage. The body may include a support arm that supports the element. The mask stage may include a seat arm that supports the element.

    摘要翻译： 全息曝光装置可以包括主体，由身体支撑的掩模台，由掩模台支撑的全息掩模，以及设置在主体和掩模台之间的驱动单元。 全息曝光装置可以包括由衬底台支撑的物体，与物体间隔开并由掩模台支撑的全息掩模，由掩模台支撑的主体以及设置在掩模台与主体之间的驱动单元 控制面膜舞台与身体之间的间隙。 全息曝光装置可以包括主体，由主体支撑的掩模台，由掩模台支撑的全息掩模，以及设置在主体和掩模台之间的压电元件。 主体可以包括支撑元件的支撑臂。 掩模台可以包括支撑元件的座臂。

    Holographic exposure apparatuses
    9.
    发明申请
    Holographic exposure apparatuses 审中-公开
    全息曝光装置

    公开(公告)号：US20100208226A1

    公开(公告)日：2010-08-19

    申请号：US12656291

    申请日：2010-01-25

    申请人： Oui Serg Kim ,  In Bae Jang ,  Sung Jin Lee ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park

    发明人： Oui Serg Kim ,  In Bae Jang ,  Sung Jin Lee ,  Sung Hwi Cho ,  Kyen Hee Lee ,  Sang Joon Hong ,  Sang Wook Park

    IPC分类号： G03B27/58 ,  G03H1/20

    CPC分类号： G03H1/0408 ,  G03F7/70408 ,  G03H2001/0094

    摘要： A holographic exposure apparatus may include an object to be exposed, a holographic mask on which a pattern to be transferred onto the object is formed, a stage to support the mask, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the stage. A holographic exposure apparatus also may include an object to be exposed, a mask spaced apart from the object, a holder that holds the mask, and a stage on which the holder is movably mounted such that a gap between the mask and object is adjusted. In addition, a holographic exposure apparatus may include a stage, a prism supported by the stage, a mask spaced apart from the prism and supported by the stage, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the prism.

    摘要翻译： 全息曝光装置可以包括要被曝光的物体，其上形成有被转印到物体上的图案的全息掩模，用于支撑掩模的台，以及设置在掩模和台之间以便移动的间隙调节单元 面具相对于舞台。 全息曝光装置还可以包括要曝光的物体，与物体间隔开的掩模，保持掩模的保持器以及保持器可移动地安装在其上的台阶，从而调节掩模和物体之间的间隙。 此外，全息曝光装置可以包括舞台，由舞台支撑的棱镜，与棱镜间隔开并由舞台支撑的掩模以及设置在掩模和舞台之间的间隙调节单元，以便移动面罩相对 到棱镜。