Method of processing silicon substrate and method of manufacturing liquid discharge head
    3.
    发明授权
    Method of processing silicon substrate and method of manufacturing liquid discharge head 有权
    硅衬底的处理方法和液体排出头的制造方法

    公开(公告)号:US08197705B2

    公开(公告)日:2012-06-12

    申请号:US12203536

    申请日:2008-09-03

    IPC分类号: G01D15/00 G11B5/127

    摘要: A method of manufacturing a substrate for a liquid discharge head having a silicon substrate in which a liquid supply port is provided includes providing the silicon substrate, an etching mask layer having an aperture being formed on one surface of the silicon substrate, forming a region comprising an amorphous silicon in the interior of the silicon substrate by irradiating the silicon substrate with laser light, forming a recess, which has an opening at a part of a portion exposed from the aperture on the one surface, from the one surface of the silicon substrate toward the region, and forming the supply port by performing etching on the silicon substrate in which the recess and the region have been formed from the one surface through the aperture of the etching mask layer.

    摘要翻译: 一种制造具有其中提供液体供应口的硅衬底的液体排出头的衬底的方法包括提供硅衬底,具有形成在硅衬底的一个表面上的孔的蚀刻掩模层,形成包括 通过用激光照射硅衬底,在硅衬底的内部形成非晶硅,在硅衬底的一个表面上形成凹部,该凹部具有从一个表面上的孔露出的部分的一部分的开口 并且通过在蚀刻掩模层的孔径上从一个表面形成凹部和区域的硅衬底上进行蚀刻来形成供给口。

    METHOD OF PROCESSING SILICON SUBSTRATE AND METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD
    4.
    发明申请
    METHOD OF PROCESSING SILICON SUBSTRATE AND METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD 有权
    硅基板的加工方法及制造液体放电头的方法

    公开(公告)号:US20090065481A1

    公开(公告)日:2009-03-12

    申请号:US12203536

    申请日:2008-09-03

    IPC分类号: B44C1/22

    摘要: A method of manufacturing a substrate for a liquid discharge head having a silicon substrate in which a liquid supply port is provided includes providing the silicon substrate, an etching mask layer having an opening being formed on a one surface of the silicon substrate, forming a region comprising an amorphous silicon in the interior of the silicon substrate by irradiating the silicon substrate with laser light, forming a recess, which has an opening at a part of a portion exposed from said opening on said one surface, from said one surface of the silicon substrate toward the region, and forming the supply port by performing etching on the silicon substrate in which the recess and the region have been formed from said one surface through the opening of the etching mask layer.

    摘要翻译: 一种制造具有其中提供液体供给口的硅基板的液体排出头的基板的方法包括:提供硅基板,在硅基板的一个表面上形成有开口的蚀刻掩模层,形成区域 在所述硅衬底的内部通过用激光照射所述硅衬底而形成非晶硅,形成在所述一个表面的所述一个表面上从所述一个表面上的所述开口露出的部分具有开口的凹部 基板朝向该区域,并且通过在通过蚀刻掩模层的开口从所述一个表面形成凹部和区域的硅基板上进行蚀刻来形成供给口。

    METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD SUBSTRATE
    5.
    发明申请
    METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD SUBSTRATE 有权
    液体放电头基板的制造方法

    公开(公告)号:US20090065472A1

    公开(公告)日:2009-03-12

    申请号:US12203612

    申请日:2008-09-03

    IPC分类号: G11B5/127

    摘要: To provide a manufacturing method, for a liquid discharge head substrate that includes a silicon substrate in which a liquid supply port is formed, includes the steps of: preparing the silicon substrate, on one face of which a mask layer, in which an opening has been formed, is deposited; forming a first recessed portion in the silicon substrate, so that the recessed portion is extended through the opening from the one face of the silicon substrate to the other, reverse face of the silicon substrate; forming a second recessed portion by performing wet etching for the substrate, via the first recessed portion, using the mask layer; and performing dry etching for the silicon substrate in a direction from the second recessed portion to the other face.

    摘要翻译: 为了提供一种制造方法,对于包括其中形成有液体供给口的硅基板的液体排出头基板,包括以下步骤:制备硅基板,其一面上具有开口的掩模层 已经形成,被存放; 在所述硅衬底中形成第一凹部,使得所述凹部从所述硅衬底的一个面向所述开口延伸到所述硅衬底的另一面; 通过使用掩模层经由第一凹部对基板进行湿法蚀刻来形成第二凹部; 并且在从第二凹部到另一面的方向上对硅衬底进行干蚀刻。

    Substrate for inkjet printing head and method for manufacturing the substrate
    6.
    发明授权
    Substrate for inkjet printing head and method for manufacturing the substrate 有权
    用于喷墨打印头的基板和用于制造基板的方法

    公开(公告)号:US08182072B2

    公开(公告)日:2012-05-22

    申请号:US12105931

    申请日:2008-04-18

    IPC分类号: B41J2/05

    摘要: There is provided a substrate for an inkjet printing head and a method for manufacturing the same, in which the substrate has a structure that different kinds of metals do not come into contact with ink or moisture. For this purpose, the structure is constituted such that a diffusion preventing layer for mainly protecting a lower layer among power wiring metals is covered by a metal layer for mainly supplying power, in connection with its upper surface and at least part of a side surface. Herewith, since a single metal appears on a surface of the power wiring including up to its side surface, even circumstance occurs of coming into contact with the ink or the moisture, a battery reaction accompanied by difference of ionization tendency is not generated, and thus corrosion or short-circuit of the power wiring is suppressed.

    摘要翻译: 提供了一种用于喷墨打印头的基板及其制造方法,其中基板具有不同种类的金属不与墨水或湿气接触的结构。 为此,结构被构造成使得用于主要保护电力布线金属中的下层的扩散防止层由其上表面和至少一部分侧表面的主要供电的金属层覆盖。 因此,由于在直到其侧面的电力布线的表面上出现单个金属,所以即使发生与墨水或水分接触的情况,也不会产生伴随电离倾向差的电池反应,因此 抑制了电源线的腐蚀或短路。

    Method for manufacturing liquid discharge head
    7.
    发明授权
    Method for manufacturing liquid discharge head 有权
    液体排放头的制造方法

    公开(公告)号:US08177988B2

    公开(公告)日:2012-05-15

    申请号:US12203549

    申请日:2008-09-03

    IPC分类号: H01B13/00

    摘要: A method for manufacturing a substrate for a liquid discharge head having a silicon substrate provided with a supply port of a liquid comprises steps of preparing a substrate which is provided with a passive film on one side face thereof, has a first recess and a second recess provided therein so as to penetrate from the one side face into the inner part through the passive film, wherein the recesses satisfy a relation of a ×tan 54.7 degrees≦d, where a is defined as a distance between the first recess and the second recess, and d is defined as a depth of the second recess, and forming the supply port by anisotropically etching the crystal from the one side face.

    摘要翻译: 一种用于制造具有设置有液体供应口的硅基板的液体排出头基板的方法,包括在其一个侧面上准备设置有钝化膜的基板的步骤,具有第一凹部和第二凹部 设置在其中以便通过钝化膜从一个侧面穿透到内部部分,其中凹部满足a×tan 54.7度& nlE; d的关系,其中a被定义为第一凹部和第二凹部之间的距离 ,d被定义为第二凹部的深度,并且通过从一个侧面各向异性地蚀刻晶体来形成供给口。

    METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD
    8.
    发明申请
    METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID DISCHARGE HEAD 有权
    液体放电头的制造方法

    公开(公告)号:US20090065482A1

    公开(公告)日:2009-03-12

    申请号:US12203651

    申请日:2008-09-03

    IPC分类号: B44C1/22

    摘要: Provided is a method of manufacturing a substrate for a liquid discharge head, the substrate including a silicon substrate with a liquid supply opening formed therein, the method including: forming one processed portion by laser processing on the substrate from one surface of the substrate; expanding the one processed portion to form a recess portion by performing laser processing at a position which overlaps a part of the one processed portion and does not overlap another part of the one processed portion; and etching from the one surface the substrate with the recess portion formed therein to form the liquid supply opening.

    摘要翻译: 本发明提供一种液体排出头用基板的制造方法,其特征在于,具备形成有液体供给口的硅基板的基板,其特征在于,具备:在所述基板的一个表面上通过激光加工形成1个处理部; 通过在与所述一个处理部分的一部分重叠的位置处进行激光处理并且不与所述一个处理部分的另一部分重叠来扩展所述一个处理部分以形成凹部; 并且从一个表面蚀刻具有形成在其中的凹部的基板以形成液体供应​​开口。

    METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD
    9.
    发明申请
    METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD 有权
    制造液体放电头的方法

    公开(公告)号:US20090065476A1

    公开(公告)日:2009-03-12

    申请号:US12203549

    申请日:2008-09-03

    IPC分类号: B44C1/22

    摘要: A method for manufacturing a substrate for a liquid discharge head having a silicon substrate provided with a supply port of a liquid comprises steps of preparing a substrate which is provided with a passive film on one side face thereof, has a first recess and a second recess provided therein so as to penetrate from the one side face into the inner part through the passive film, wherein the recesses satisfy a relation of a×tan 54.7 degrees≦d, when a is defined as a distance between the first recess and the second recess, and d is defined as a depth of the second recess, and forming the supply port by anisotropically etching the crystal from the one side face.

    摘要翻译: 一种用于制造具有设置有液体供应口的硅基板的液体排出头基板的方法,包括在其一个侧面上准备设置有钝化膜的基板的步骤,具有第一凹部和第二凹部 设置在其中以便通过所述钝化膜从所述一个侧面穿透到所述内部,其中当所述凹陷被定义为所述第一凹部和所述第二凹部之间的距离时,所述凹部满足斧头的关系为54.7度< d定义为第二凹部的深度,并且通过从一个侧面各向异性地蚀刻晶体来形成供给口。