Chemicallly amplified resist composition
    1.
    发明授权
    Chemicallly amplified resist composition 有权
    化学放大抗蚀剂组合物

    公开(公告)号:US07741007B2

    公开(公告)日:2010-06-22

    申请号:US11987672

    申请日:2007-12-03

    IPC分类号: G03F7/004

    摘要: The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译: 本发明提供一种化学放大抗蚀剂组合物,其包含:(A)由式(1)表示的盐,其中在说明书中定义的R 21,Q 1,Q 2和A + (B)由式(II)表示的盐:其中R 22,Q 3,Q 4和A'+在本说明书中定义; 和(C)含有具有酸不稳定基团的结构单元的结构单元的树脂,其本身在碱性水溶液中不溶或难溶,但通过酸作用而溶于碱水溶液中。

    Chemically amplified resist composition
    2.
    发明申请
    Chemically amplified resist composition 有权
    化学放大抗蚀剂组合物

    公开(公告)号:US20080213695A1

    公开(公告)日:2008-09-04

    申请号:US11987672

    申请日:2007-12-03

    IPC分类号: G03F7/004

    摘要: The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): wherein R21 represents a C1-C30 hydrocarbon group, Q1 and Q2 each represent a fluorine atom, and A+ represents at least one organic cation represented by (Ia): wherein P1-P3 each represent C1-C30 alkyl group, a cation represented by (Ib): wherein P4 and P5 each represent a hydrogen atom, and a cation represented by (Ic): wherein P10-P21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1; (B) a salt (II): wherein R22 represents C1-C30 hydrocarbon group, Q3 and Q4 each represent fluorine atom, and A′+ represents an organic cation (IIa): wherein P6 and P7 are each a C1-C12 alkyl group, P8 represents hydrogen atom, P9 represents C1-C12 alkyl group; and (C) a resin which contains a structural unit having an acid-labile group.

    摘要翻译: 本发明提供一种化学放大抗蚀剂组合物,其包含:(A)由(I)表示的盐:其中R 21表示C 1 -C 30烃基,Q 1和 Q 2各自表示氟原子,A 0 +表示由(Ia)表示的至少一种有机阳离子:其中P 1〜 SUP> 3各自表示C1-C30烷基,由(Ib)表示的阳离子:其中P 4和P 5各自表示氢原子,和 由(Ic)表示的阳离子:其中P为10〜21个,各自表示氢原子,B表示硫或氧原子,m表示0或1; (B)盐(II):其中R 22表示C 1 -C 30烃基,Q 3和Q 4各自表示氟原子, 并且A' +表示有机阳离子(IIa):其中P 6和P 7各自为C 1 -C 12烷基, SUP> 8表示氢原子,P 9表示C1-C12烷基; 和(C)含有具有酸不稳定基团的结构单元的树脂。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    3.
    发明申请
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US20070027336A1

    公开(公告)日:2007-02-01

    申请号:US11390319

    申请日:2006-03-28

    IPC分类号: C07C309/51

    CPC分类号: C07C309/17 C07C2603/74

    摘要: The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

    摘要翻译: 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示当Q为-C(OH) - 基团或其中两个氢原子被≡O基团取代时,其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    4.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US08124803B2

    公开(公告)日:2012-02-28

    申请号:US11390319

    申请日:2006-03-28

    IPC分类号: C07C309/19

    CPC分类号: C07C309/17 C07C2603/74

    摘要: The present invention provides a salt of the formula (L)A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ═O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

    摘要翻译: 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示具有3〜30个碳原子的单环或多环烃基,其中当Q为-C(OH) - 基时,其中氢原子被Q位上的羟基取代,或其中两个氢原子被取代为= 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1〜6个碳原子的全氟烷基; 而A +代表有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。

    Chemically amplified resist composition
    5.
    发明授权
    Chemically amplified resist composition 有权
    化学放大抗蚀剂组合物

    公开(公告)号:US07575850B2

    公开(公告)日:2009-08-18

    申请号:US12021149

    申请日:2008-01-28

    IPC分类号: G03F7/004

    摘要: The present invention provides a chemically amplified resist composition comprising: a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—, and a salt represented by the formula (III): A′+−O3S—R23  (III) wherein R23 represents a C1-C8 linear or branched chain perfluoroalkyl group and A′+ represents an organic counter ion.

    摘要翻译: 本发明提供一种化学放大抗蚀剂组合物,其包含:树脂,其包含具有酸不稳定基团的结构单元和由式(I)表示的结构单元:其中R1表示氢原子或甲基,环X表示 C 1 -C 30环烃基,其中一个-CH 2 - 被-COO-取代,并且C 3 -C 30环烃基中的至少一个氢原子可以被取代,p表示1〜4的整数, 本身在碱性水溶液中不溶或难溶,但是通过酸的作用而溶于碱性水溶液中,以及选自式(II)表示的盐中的至少两种盐:其中Y1和Y2各自独立地表示 氟原子或C1-C6全氟烷基,A +表示有机抗衡离子,R21表示可以被取代的C1-C30烃基,C1-C30烃基中的至少一个-CH2-可以是取代基 d与-CO-或-O-,以及由式(III)表示的盐:<?in-line-formula description =“In-line formula”end =“lead”?> A'+ - O3S-R23 (III)<?in-line-formula description =“In-line Formulas”end =“tail”?>其中R23表示C1-C8直链或支链全氟烷基,A'+表示有机抗衡离子。

    CHEMICALLY AMPLIFIED RESIST COMPOSITION
    6.
    发明申请

    公开(公告)号:US20080176168A1

    公开(公告)日:2008-07-24

    申请号:US11961867

    申请日:2007-12-20

    IPC分类号: G03F7/004

    摘要: A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group which may be substituted, and at least one —CH2— in the hydrocarbon group may be substituted by —CO— or —O—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, B represents a sulfur or oxygen atom and m represents 0 or 1, (B) a salt represented by the formula (II): A′+−O3S-Q3   (II) wherein Q3 represents a C1-C10 perfluoroalkyl group or a C4-C8 perfluorocycloalkyl group, and A′+ represents an organic cation represented by the formula (IIa): wherein P6 and P7 each independently represent a C1-C12 alkyl group or a C3-C12 cycloalkyl group, or P6 and P7 are bonded to form a C3-C12 divalent acyclic hydrocarbon group which forms a ring together with the adjacent S+, and at least one —CH2— in the divalent acyclic hydrocarbon group may be substituted with —CO—, —O— or —S—, P8 represents a hydrogen atom, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted, or P8 and P9 are bonded to form a divalent acyclic hydrocarbon group which forms a 2-oxocycloalkyl group together with the adjacent —CHCO—, and at least one —CH2— in the divalent acyclic hydrocarbon group may be replaced with —CO—, —O— or —S—; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

    Resist composition and method for producing resist pattern
    7.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US09176378B2

    公开(公告)日:2015-11-03

    申请号:US13441185

    申请日:2012-04-06

    IPC分类号: G03F7/004 G03F7/039 G03F7/20

    摘要: A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.

    摘要翻译: 本发明的抗蚀剂组合物包括:(A)在碱性水溶液中不溶或难溶的树脂,但是通过酸作用而溶于碱性水溶液中的树脂,(B)由式(II)表示的酸发生剂 )和(D)由式(I)表示的化合物,其中R1,R2,m,n,Q1,Q2,L1,环W1和Z +在说明书中定义。

    Resist composition and method for producing resist pattern
    8.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US09128373B2

    公开(公告)日:2015-09-08

    申请号:US13441035

    申请日:2012-04-06

    IPC分类号: G03F7/004 G03F7/039 G03F7/20

    摘要: A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

    摘要翻译: 抗蚀剂组合物包括: (A)在碱性水溶液中不溶或难溶的树脂,但是通过酸的作用变得可溶于碱性水溶液,(B)具有酸不稳定基团的酸发生剂; 和(D)式(I)表示的化合物,其中R 1和R 2各自独立地表示C1〜C12烃基,C1〜C6烷氧基,C2〜C7酰基,C2〜C7酰氧基 C2-C7烷氧基羰基,硝基或卤素原子; m和n独立地表示0〜4的整数。

    Image decoding device
    9.
    发明授权
    Image decoding device 有权
    图像解码装置

    公开(公告)号:US08971401B2

    公开(公告)日:2015-03-03

    申请号:US13246503

    申请日:2011-09-27

    申请人: Satoshi Yamaguchi

    发明人: Satoshi Yamaguchi

    摘要: An image decoding device for processing an input bit stream containing encoded data obtained by encoding a moving picture using intra-frame prediction, includes a stream divider configured to divide the input bit stream into a plurality of sub-streams, and a plurality of image decoders each configured to decode the corresponding one of the plurality of sub-streams, thereby outputting images. The stream divider divides the input bit stream so that the plurality of sub-streams each contain the encoded data corresponding to one or more prediction units, where macroblocks of the moving picture each include a plurality of the prediction units for the intra-frame prediction.

    摘要翻译: 一种用于处理包含通过使用帧内预测对运动图像进行编码获得的编码数据的输入比特流的图像解码装置,包括:流分配器,被配置为将输入比特流划分为多个子流,以及多个图像解码器 每个被配置为对多个子流中的相应一个子流进行解码,从而输出图像。 流分配器分割输入比特流,使得多个子流各自包含对应于一个或多个预测单元的编码数据,其中运动图像的宏块各自包括用于帧内预测的多个预测单元。

    Resist composition and method for producing resist pattern
    10.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US08741543B2

    公开(公告)日:2014-06-03

    申请号:US13551874

    申请日:2012-07-18

    摘要: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, wherein R1, A1, A13, A14, X12 are defined in the specification.

    摘要翻译: 一种抗蚀剂组合物,其具有由式(I)表示的结构单元的树脂,树脂在碱性水溶液中不溶或难溶,但通过酸而不溶于碱性水溶液,不包括结构单元 由式(I)表示的酸产生剂和具有酸不稳定基团的酸产生剂,其中R1,A1,A13,A14,X12在说明书中定义。