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    Micromirror array device
    1.
    发明申请
    Micromirror array device 有权
    微镜阵列器件

    公开(公告)号：US20050196896A1

    公开(公告)日：2005-09-08

    申请号：US11110184

    申请日：2005-04-19

    申请人： Satyadev Patel ,  Andrew Huibers ,  Chris Spindt ,  Peter Heureux

    发明人： Satyadev Patel ,  Andrew Huibers ,  Chris Spindt ,  Peter Heureux

    IPC分类号： G09G3/34

    CPC分类号： G09G3/346 ,  G02B26/0833 ,  G09G2300/0426 ,  G09G2300/0465

    摘要： Disclosed herein is a micromirror array device that comprises an array of reflective deflectable mirror plates each being associated with one single addressing electrode to be deflected to an ON state angle. A light transmissive electrode is disposed proximate to the mirror plates for deflecting the mirror plates to a non-zero OFF angle. The mirror plates are arranged in the array with a center-to-centre distance of 10.17 microns or less.

    摘要翻译： 本文公开了一种微镜阵列器件，其包括反射偏转镜板阵列，每个反射镜阵列与一个单个寻址电极相关联以被偏转到ON状态角。 透光电极设置在靠近镜板的位置，用于将镜板偏转到非零OFF角度。 镜面阵列布置在阵列中，中心距离为10.17微米或更小。

    Spatial light modulators with non-uniform pixels
    3.
    发明申请
    Spatial light modulators with non-uniform pixels 有权
    具有不均匀像素的空间光调制器

    公开(公告)号：US20060082856A1

    公开(公告)日：2006-04-20

    申请号：US10969503

    申请日：2004-10-19

    申请人： Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    发明人： Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    IPC分类号： G02B26/00

    CPC分类号： G02B26/0833 ,  G02B26/0841 ,  H04N9/3114 ,  Y10S359/904

    摘要： A micromirror array comprises micromirrors of different properties for use particularly in display systems. Micromirrors of different properties can be arranged within the micromirror array according to a predetermined pattern, or randomly. However, it is advantageous to arrange the micromirrors with different properties within the micromirror array neither in complete order nor complete in random.

    摘要翻译： 微镜阵列包括用于特别在显示系统中的不同性质的微镜。 可以根据预定图案或随机地将不同性质的微镜布置在微镜阵列内。 然而，有利的是在微镜阵列内布置具有不同特性的微反射镜，既不是完全顺序的也不是随机完成的。

    Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants
    4.
    发明申请
    Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants 审中-公开
    通过用多个顺序蚀刻剂去除牺牲层来制造微机械装置的方法

    公开(公告)号：US20050045276A1

    公开(公告)日：2005-03-03

    申请号：US10922565

    申请日：2004-08-19

    申请人： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

    发明人： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

    IPC分类号： B81B3/00 ,  C23F1/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461

    CPC分类号： B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

    摘要： An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

    摘要翻译： 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

    High angle micro-mirrors and processes
    6.
    发明申请
    High angle micro-mirrors and processes 有权

    公开(公告)号：US20050078349A1

    公开(公告)日：2005-04-14

    申请号：US10990835

    申请日：2004-11-16

    申请人： Satyadev Patel ,  Andrew Huibers ,  Peter Heureux

    发明人： Satyadev Patel ,  Andrew Huibers ,  Peter Heureux

    IPC分类号： G02B26/08 ,  G02B26/00

    CPC分类号： G02B26/0841

    摘要： A micro-mirror that comprises a substrate, a hinge structure formed on the substrate and a mirror plate attached to the hinge structure is provided for use in display systems. The mirror plate is capable of rotating from a non-deflected resting state to a state that is at least 14° degrees. In operation, the micro-mirror switches between an “ON”-state and “OFF”-state, which are defined in accordance with a rotational position of the mirror plate. The OFF state can be a non-deflected position of the micro-mirror (generally parallel to the substrate), the same angle (though opposite direction) as the ON state, or an angle less than the ON state (though in the opposite direction). Reflected light from the “ON” and “OFF” states are thus separated and the contrast ratio is improved.

    Spatial light modulators with non-uniform pixels
    7.
    发明授权
    Spatial light modulators with non-uniform pixels 有权
    具有不均匀像素的空间光调制器

    公开(公告)号：US07158279B2

    公开(公告)日：2007-01-02

    申请号：US10969503

    申请日：2004-10-19

    申请人： Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    发明人： Satyadev Patel ,  Regis Grasser ,  Andrew Huibers ,  Peter Heureux

    IPC分类号： G02B26/00 ,  G02B26/08

    CPC分类号： G02B26/0833 ,  G02B26/0841 ,  H04N9/3114 ,  Y10S359/904

    摘要： A micromirror array comprises micromirrors of different properties for use particularly in display systems. Micromirrors of different properties can be arranged within the micromirror array according to a predetermined pattern, or randomly. However, it is advantageous to arrange the micromirrors with different properties within the micromirror array neither in complete order nor complete in random.

    摘要翻译： 微镜阵列包括用于特别在显示系统中的不同性质的微镜。 可以根据预定图案或随机地将不同性质的微镜布置在微镜阵列内。 然而，有利的是在微镜阵列内布置具有不同特性的微反射镜，既不是完全顺序的也不是随机完成的。

    Micromirrors and hinge structures for micromirror arrays in projection displays
    9.
    发明授权
    Micromirrors and hinge structures for micromirror arrays in projection displays 有权
    投影显示器中微镜阵列的微镜和铰链结构

    公开(公告)号：US07436572B2

    公开(公告)日：2008-10-14

    申请号：US10927408

    申请日：2004-08-25

    申请人： Andrew Huibers ,  Satyadev Patel

    发明人： Andrew Huibers ,  Satyadev Patel

    IPC分类号： G02B26/02 ,  G03B21/26

    CPC分类号： H04N5/7458 ,  G02B26/008 ,  G02B26/0841 ,  G03B21/008

    摘要： A spatial light modulator is disclosed, along with methods for making such a modulator. The spatial light modulator comprises an array of micromirrors each having a hinge and a micromirror plate held via a hinge on a substrate, the micromirror plate being attached to the hinge such that the micromirror plate can rotate along a rotation axis and the hinge structure is located between the micromirror plate and the light source. The mirror plate is formed between the hinge and the substrate on which the hinge is formed. As a result, the hinge is exposed to the incident light during the operation.

    摘要翻译： 公开了一种空间光调制器以及用于制造这种调制器的方法。 空间光调制器包括微镜阵列，每个微镜具有通过基板上的铰链保持的铰链和微镜板，微镜板附接到铰链，使得微镜板可以沿着旋转轴线旋转并且铰链结构位于 在微镜板和光源之间。 镜板形成在铰链和形成有铰链的基板之间。 结果，在操作期间铰链暴露于入射光。

    Micromirror device
    10.
    发明授权
    Micromirror device 有权
    微镜装置

    公开(公告)号：US07411717B2

    公开(公告)日：2008-08-12

    申请号：US11256035

    申请日：2005-10-21

    申请人： Satyadev Patel ,  Andrew Huibers

    发明人： Satyadev Patel ,  Andrew Huibers

    IPC分类号： G02B26/00

    CPC分类号： G02B26/0841

    摘要： A spatial light modulator comprises an array of micromirror devices each of which has a reflective and deflectable mirror plates. The mirror plates are moved between an ON and OFF state during operation, wherein the OFF state is a state wherein the mirror plate is not parallel to the substrate on which the mirror plate is formed. The micromirror device may have an ON state stopper for limiting the rotation of the mirror plate at the ON state angle, but does not have an OFF state stopper. The non-zero OFF state is achieved by attaching the mirror plate to a deformable hinge held by a hinge support that is curved at the natural resting state.

    摘要翻译： 空间光调制器包括微镜器件的阵列，每个微镜器件具有反射和可偏转的镜板。 在操作期间，镜板在ON和OFF状态之间移动，其中OFF状态是其中镜板不平行于其上形成有镜板的基板的状态。 微反射镜装置可以具有ON状态止动器，用于将镜板的旋转限制在ON状态角度，但不具有OFF状态挡块。 通过将镜板附接到由在自然静止状态下弯曲的铰链支撑件保持的可变形铰链来实现非零关闭状态。