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公开(公告)号：US20070261013A1
公开(公告)日：2007-11-08
申请号：US11778302
申请日：2007-07-16
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G06F2217/12 , Y02P90/265
摘要： A method of conveying the designer's intended electrical characteristics for a semiconductor design is provided by forming tolerance bands for a design layer of interest that take into consideration constraints from design layers that interact with and influence the features on the design layer of interest. The method determines regions, i.e. tolerance bands, within which the printed edges of features of the layer of interest will print within a predetermined criterion, and satisfy a variety of constraints, including, but not limited to, electrical, overlay and manufacturability constraints arising from the influence of features on other layers. The method may be implemented in a computer program product for execution on a computer system. The resulting tolerance bands can be used to efficiently convey the designer's intent to a lithographer, an OPC engineer or a mask manufacturer or tool.
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2.发明申请公开(公告)号：US20070083847A1
公开(公告)日：2007-04-12
申请号：US11163264
申请日：2005-10-12
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G06F2217/12 , Y02P90/265
摘要： A method of conveying the designer's intended electrical characteristics for a semiconductor design is provided by forming tolerance bands for a design layer of interest that take into consideration constraints from design layers that interact with and influence the features on the design layer of interest. The method determines regions, i.e. tolerance bands, within which the printed edges of features of the layer of interest will print within a predetermined criterion, and satisfy a variety of constraints, including, but not limited to, electrical, overlay and manufacturability constraints arising from the influence of features on other layers. The method may be implemented in a computer program product for execution on a computer system. The resulting tolerance bands can be used to efficiently convey the designer's intent to a lithographer, an OPC engineer or a mask manufacturer or tool.
摘要翻译： 通过为感兴趣的设计层形成公差带来提供设计者用于半导体设计的预期电气特性的方法，其考虑到与感兴趣的设计层上的特征相互作用并影响其特征的设计层的约束。 该方法确定区域，即公差带，其中感兴趣层的特征的打印边缘将在预定标准内打印，并且满足各种约束，包括但不限于电气，重叠和可制造性约束 特征对其他层的影响。 该方法可以在用于在计算机系统上执行的计算机程序产品中实现。 所得到的公差带可用于有效传达设计人员对平版印刷机，OPC工程师或掩模制造商或工具的意图。
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公开(公告)号：US20070220476A1
公开(公告)日：2007-09-20
申请号：US11306750
申请日：2006-01-10
申请人： Maharaj Mukherjee , James Culp , Lars Liebmann , Scott Mansfield
发明人： Maharaj Mukherjee , James Culp , Lars Liebmann , Scott Mansfield
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method is provided for designing a mask layout for an integrated circuit that ensures proper functional interaction among circuit features by including functional inter-layer and intra-layer constraints on the wafer. The functional constraints used according to the present invention are applied among the simulated wafer images to ensure proper functional interaction, while relaxing or eliminating the EPE constraints on the location of the wafer images.
摘要翻译： 提供了一种用于设计用于集成电路的掩模布局的方法，其通过在晶片上包括功能层间和层内约束来确保电路特征之间的适当的功能交互。 根据本发明使用的功能约束应用于模拟晶片图像中，以确保正确的功能交互，同时放松或消除对晶片图像的位置的EPE约束。
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4.发明申请SYSTEM AND METHOD OF SMOOTHING MASK SHAPES FOR IMPROVED PLACEMENT OF SUB-RESOLUTION ASSIST FEATURES 失效用于改进分层辅助功能放置的掩模形状的系统和方法公开(公告)号：US20050153212A1
公开(公告)日：2005-07-14
申请号：US10707778
申请日：2004-01-12
申请人： Mark Lavin , Lars Liebmann , Scott Mansfield , Maharaj Mukherjee , Zengqin Zhao
发明人： Mark Lavin , Lars Liebmann , Scott Mansfield , Maharaj Mukherjee , Zengqin Zhao
CPC分类号： G03F1/36
摘要： A method is disclosed for providing associated shapes of an optical lithography mask in relation to predetermined main shapes of the mask. The method includes generating simplified layout patterns from the predetermined main shapes of the mask. Such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information. The associated shapes are then generated relative to the simplified mask patterns.
摘要翻译： 公开了一种相对于掩模的预定主要形状提供光学光刻掩模的相关形状的方法。 该方法包括从掩模的预定主要形状生成简化的布局图案。 通过消除导致不可制造的相关形状的主要形状的细节来产生这种布局图案，同时保留几何相关的形状信息。 然后相对于简化的掩模图案生成相关联的形状。
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公开(公告)号：US08953440B2
公开(公告)日：2015-02-10
申请号：US13493039
申请日：2012-06-11
申请人： Ghani Abbas , Scott Mansfield
发明人： Ghani Abbas , Scott Mansfield
IPC分类号： H04L12/26 , H04L12/803 , H04L12/911 , H04L12/923 , H04L12/729 , H04L12/707
CPC分类号： H04L47/122 , H04L41/0654 , H04L45/125 , H04L45/22 , H04L47/125 , H04L47/2408 , H04L47/746 , H04L47/762 , H04W28/0284
摘要： A method for adjusting bandwidth in a communications network having a plurality of nodes connected over multiple links with a plurality of services running on the links includes detecting an impairment of a link wherein the impairment invokes a reduction in bandwidth available to the services running on the link, communicating information about the impairment to other nodes in the network and redistributing services between the links to limit a bandwidth required by services running on the impaired link to a value not exceeding the bandwidth available on the impaired link.
摘要翻译： 一种用于调整通信网络中带宽的方法，所述通信网络具有通过多个链路连接的多个节点与在所述链路上运行的多个服务连接的多个节点包括检测链路的损害，其中所述损害调用可用于在所述链路上运行的服务的可用带宽的减小 向网络中的其他节点传递关于该损害的信息，并在链路之间重新分配业务，将受损链路上运行的业务所需的带宽限制在不超过受损链路可用带宽的值。
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公开(公告)号：US07029830B2
公开(公告)日：2006-04-18
申请号：US09940415
申请日：2001-08-28
IPC分类号： G02F7/00
CPC分类号： G03F7/70091 , G03F1/20
摘要： Aperture members are provided wherein there is thin 1–10 micrometer thick crystaline membrane that is surrounded by a frame of a bulk type crystalline material. The aperture being an opening through the membrane in a typical shape useful for device fabrication, such as a circle or pattern. The aperture member of the invention can be fabricated out of a typical silicon crystalline wafer in a process where doping in a region serves as an etch stop.
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公开(公告)号：US06553559B2
公开(公告)日：2003-04-22
申请号：US09754910
申请日：2001-01-05
IPC分类号： G06F1750
CPC分类号： G03F1/36 , G03F7/70441
摘要： Optical proximity correction (OPC) and assist feature rules are generated using a process window (PW) analysis. A reference pitch is chosen and the mask bias is found that optimizes the process window. This can be done using standard process window analysis or through a weighted process window (WPW) analysis which accounts for focus and dose distributions that are expected in a real process. The WPW analysis gives not only the optimum mask bias, but also the center focus and dose conditions for the optimum process centering. A series of other pitches and mask biases are then analyzed by finding the common process window with the reference pitch. For the standard PW analysis, a common process window is found. For the WPW analysis, the WPW is computed at the center focus and dose conditions found for the reference pitch. If mask or lens errors are to be accounted for, then multiple structures can be included in the analysis. Once the common process windows for the mask features of interest have been computed, functional fits to the data can be found. Once the functional forms have been found for each of the OPC parameters, the rules table can be determined by solving for the spacings of interest in the design.
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公开(公告)号：US06602728B1
公开(公告)日：2003-08-05
申请号：US09754920
申请日：2001-01-05
IPC分类号： G01R3126
CPC分类号： G03F1/36 , G03F1/68 , G03F7/70441 , G03F7/705
摘要： A method for generating an optical proximity correction (OPC) model includes generating a set of correction rules for a wafer design containing at least one of lines and assist features, determining a set of corrections that need to be made over a range of sizes and spaces of the lines and assist features based on the set of correction rules, and creating an optical proximity correction model for correcting the wafer design based on the set of corrections.
摘要翻译： 一种用于产生光学邻近校正（OPC）模型的方法包括为包含线和辅助特征中的至少一个的晶片设计生成一组校正规则，确定需要在一定范围的尺寸和空间上进行的一组校正 基于该组校正规则的线和辅助特征，以及基于该校正集创建用于校正晶片设计的光学邻近校正模型。
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9.发明授权Node and method for computing forwarding trees to distribute traffic in a network 有权用于计算转发树以在网络中分发流量的节点和方法公开(公告)号：US08923164B2
公开(公告)日：2014-12-30
申请号：US13143593
申请日：2011-06-28
申请人： János Farkas , David Ian Allan , Scott Mansfield
发明人： János Farkas , David Ian Allan , Scott Mansfield
IPC分类号： H04L12/28 , H04L12/753 , H04L12/46 , H04L12/721
CPC分类号： H04L45/48 , H04L12/4625 , H04L45/12 , H04L47/125
摘要： A node and a method are described herein for computing forwarding trees to distribute traffic in a network. In addition, a network is described herein that has a plurality of nodes interconnected to one another by a plurality of network links, and each node is configured to perform multiple rounds of forwarding tree computations to distribute traffic load on one or more of the network links to the other nodes.
摘要翻译： 本文描述了用于计算转发树以在网络中分发业务的节点和方法。 此外，这里描述了具有通过多个网络链路彼此互连的多个节点的网络，并且每个节点被配置为执行多轮转发树计算以在一个或多个网络链路上分配业务负载 到其他节点。
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公开(公告)号：US20120325994A1
公开(公告)日：2012-12-27
申请号：US13285631
申请日：2011-10-31
申请人： Scott Mansfield , Ryan Brobst
发明人： Scott Mansfield , Ryan Brobst
IPC分类号： A47F5/08
CPC分类号： A47F5/0853 , A47F7/0042 , A47F7/147
摘要： A product display bracket is configured for displaying products on a slatwall. The display bracket is configured to display products at an angle from the horizontal surface of the slatwall. The display bracket is also adapted to be removably attached to other brackets on a slatwall.
摘要翻译： 产品展示支架配置为在舷墙上显示产品。 显示支架被配置成从与舷墙的水平面成一定角度地显示产品。 显示支架也适于可拆卸地连接到舷墙上的其他支架上。
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