Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern
    1.
    发明授权
    Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern 有权
    使用原始的相位调制衍射光栅的曝光装置和器件制造方法形成干涉图案

    公开(公告)号:US09164370B2

    公开(公告)日:2015-10-20

    申请号:US12418420

    申请日:2009-04-03

    IPC分类号: G03B27/72 G03B27/32 G03F7/20

    摘要: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

    摘要翻译: 曝光用光致抗蚀剂涂覆的基板以形成光致抗蚀剂的潜像的曝光装置包括原始保持单元,其被配置为保持包括相位调制衍射光栅的原稿,使得在基板的表面上形成干涉图案 通过由原稿衍射的光束,被配置为保持基板的基板保持单元和被配置为分割光束以形成进入原稿的多个光束的光束分割光学系统,其中形成潜像 通过在基板的表面上形成的多个干涉图案叠加在基板上,分别对应于进入原稿的多个光束的多个干涉图案。

    Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus
    3.
    发明授权
    Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus 有权
    双折射测量装置,应变去除器,旋光仪和曝光装置

    公开(公告)号:US07251029B2

    公开(公告)日:2007-07-31

    申请号:US10610986

    申请日:2003-06-30

    IPC分类号: G01J4/00

    摘要: A birefringence measurement apparatus for calculating information of polarization of light emitted from an object to be measured includes a light source, a first polarization element for extracting a beam in a specific polarization direction from light emitted from the light source, a sample stage that holds an object to be measured, at least one beam splitting unit that splits the light emitted from the object into two beams having the same polarization as that of the light emitted from the object, at least two second polarization elements for extracting beams in a specific polarization direction of the light split by the beam splitting unit, at least two light-quantity detectors for detecting light quantity of beams that have transmitted through the second polarization element, and an operation part for operating a light quantity received by the light-quantity detectors.

    摘要翻译: 用于计算从待测物体发射的光的偏振信息的双折射测量装置包括光源,用于从光源发射的光中提取特定偏振方向的光束的第一偏振元件,保持 至少一个光束分离单元,其将从物体发射的光分解成具有与从物体发射的光的偏振相同的偏振光束的至少两个第二偏振元件,用于提取特定偏振方向的光束 通过分束单元分离的光,至少两个用于检测透射通过第二偏振元件的光束的光量的光量检测器和用于操作由光量检测器接收的光量的操作部分。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    曝光装置和装置制造方法

    公开(公告)号:US20090257039A1

    公开(公告)日:2009-10-15

    申请号:US12418420

    申请日:2009-04-03

    IPC分类号: G03B27/54 G03B27/72 G03B27/32

    摘要: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

    摘要翻译: 曝光用光致抗蚀剂涂覆的基板以形成光致抗蚀剂的潜像的曝光装置包括原始保持单元,其被配置为保持包括相位调制衍射光栅的原稿,使得在基板的表面上形成干涉图案 通过由原稿衍射的光束,被配置为保持基板的基板保持单元和被配置为分割光束以形成进入原稿的多个光束的光束分割光学系统,其中形成潜像 通过在基板的表面上形成的多个干涉图案叠加在基板上,分别对应于进入原稿的多个光束的多个干涉图案。

    Method and apparatus for measuring birefringence
    5.
    发明授权
    Method and apparatus for measuring birefringence 有权
    用于测量双折射的方法和装置

    公开(公告)号:US07286226B2

    公开(公告)日:2007-10-23

    申请号:US10733359

    申请日:2003-12-12

    IPC分类号: G01J4/00

    CPC分类号: G01J4/00 G01N21/23

    摘要: Disclosed is a birefringence measuring apparatus and method for measuring birefringence of a sample in a reduced time and in a simple manner. The birefringence measuring apparatus includes a light projecting unit for projecting approximately circularly polarized light upon a sample, a Stokes meter for detecting a state of polarization of light from the sample, and a calculating system for calculating birefringence of the sample on the basis of a Stokes parameter from the Stokes meter.

    摘要翻译: 公开了一种用于在缩短的时间和简单的方式测量样品的双折射的双折射测量装置和方法。 双折射测量装置包括用于将近似圆偏振光投射在样品上的光投射单元,用于检测来自样品的光的偏振状态的斯托克斯计数器,以及用于根据斯托克斯计算样品的双折射的计算系统 参数从斯托克斯计。

    Polarization state detecting system, light source, and exposure apparatus
    6.
    发明授权
    Polarization state detecting system, light source, and exposure apparatus 有权
    极化状态检测系统,光源和曝光装置

    公开(公告)号:US07180051B2

    公开(公告)日:2007-02-20

    申请号:US11256931

    申请日:2005-10-25

    IPC分类号: G02F1/01 G02B5/30

    摘要: A polarization state detecting system includes a first dividing device for dividing incident light into two light beams having the same polarization state as that of the incident light, a detector for detecting one of the two light beams from the first dividing device, through a polarizer, and an acquisition device for acquiring information regarding the polarization state of the incident light on the basis of an output of the detector. The first dividing device includes a first element, a second element and a third element. The second element is disposed so that a p-polarization component reflected by the first element is reflected by the second element as an s-polarization component. The third element is disposed so that a p-polarization component transmitted through the first element is reflected by the third element as an s-polarization component, and one of the two light beams is light reflected by the first element and reflected by the second element, while the other of the two light beams is light transmitted through the first element and transmitted through the third element.

    摘要翻译: 偏振状态检测系统包括用于将入射光分成具有与入射光相同的偏振态的两个光束的第一分割装置,用于通过偏振器检测来自第一分割装置的两个光束中的一个的检测器, 以及用于基于检测器的输出获取关于入射光的偏振状态的信息的获取装置。 第一分割装置包括第一元件,第二元件和第三元件。 第二元件设置成使得由第一元件反射的p偏振分量作为s偏振分量被第二元件反射。 第三元件设置成使得透过第一元件的p偏振分量被第三元件作为s偏振分量反射,并且两个光束中的一个被第一元件反射并由第二元件反射 而两个光束中的另一个光透过第一元件透过第三元件。

    Exposure apparatus that acquires information regarding a polarization state of light from a light source
    9.
    发明授权
    Exposure apparatus that acquires information regarding a polarization state of light from a light source 失效
    获取关于来自光源的光的偏振状态的信息的曝光装置

    公开(公告)号:US07015456B2

    公开(公告)日:2006-03-21

    申请号:US10429742

    申请日:2003-05-06

    IPC分类号: H01J40/14

    摘要: A polarization state detecting system includes a first dividing device for dividing incident light into two light beams having the same polarization state as the incident light, a detector for detecting one of the two light beams from the first dividing device, through a polarizer, and an acquisition device for acquiring information regarding the polarization state of the incident light on the basis of an output of the detector. The first dividing device includes a first element, a second element and a third element. The second element is disposed so that a p-polarization component reflected by the first element is reflected by the second element as an s-polarization component. The third element is disposed so that a p-polarization component transmitted through the first element is reflected by the third element as an s-polarization component, and one of the two light beams is light reflected by the first element and reflected by the second element, while the other of the two light beams is light transmitted through the first element and transmitted through the third element.

    摘要翻译: 偏振态检测系统包括:第一分割装置,用于将入射光分成具有与入射光相同的偏振状态的两个光束;检测器,用于通过偏振器检测来自第一分割装置的两个光束中的一个;以及 获取装置,用于基于检测器的输出获取关于入射光的偏振状态的信息。 第一分割装置包括第一元件,第二元件和第三元件。 第二元件设置成使得由第一元件反射的p偏振分量作为s偏振分量被第二元件反射。 第三元件设置成使得透过第一元件的p偏振分量被第三元件作为s偏振分量反射,并且两个光束中的一个被第一元件反射并由第二元件反射 而两个光束中的另一个光透过第一元件透过第三元件。

    Polarization state detecting system, light source, and exposure apparatus
    10.
    发明申请
    Polarization state detecting system, light source, and exposure apparatus 有权
    极化状态检测系统,光源和曝光装置

    公开(公告)号:US20060033019A1

    公开(公告)日:2006-02-16

    申请号:US11256931

    申请日:2005-10-25

    IPC分类号: H01J40/14 G02F1/01

    摘要: A polarization state detecting system includes a first dividing device for dividing incident light into two light beams having the same polarization state as that of the incident light, a detector for detecting one of the two light beams from the first dividing device, through a polarizer, and an acquisition device for acquiring information regarding the polarization state of the incident light on the basis of an output of the detector. The first dividing device includes a first element, a second element and a third element. The second element is disposed so that a p-polarization component reflected by the first element is reflected by the second element as an s-polarization component. The third element is disposed so that a p-polarization component transmitted through the first element is reflected by the third element as an s-polarization component, and one of the two light beams is light reflected by the first element and reflected by the second element, while the other of the two light beams is light transmitted through the first element and transmitted through the third element.

    摘要翻译: 偏振状态检测系统包括用于将入射光分成具有与入射光相同的偏振态的两个光束的第一分割装置,用于通过偏振器检测来自第一分割装置的两个光束中的一个的检测器, 以及用于基于检测器的输出获取关于入射光的偏振状态的信息的获取装置。 第一分割装置包括第一元件,第二元件和第三元件。 第二元件设置成使得由第一元件反射的p偏振分量作为s偏振分量被第二元件反射。 第三元件设置成使得透过第一元件的p偏振分量被第三元件作为s偏振分量反射,并且两个光束中的一个光被第一元件反射并由第二元件反射 而两个光束中的另一个光透过第一元件透过第三元件。