Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern
    1.
    发明授权
    Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern 有权
    使用原始的相位调制衍射光栅的曝光装置和器件制造方法形成干涉图案

    公开(公告)号:US09164370B2

    公开(公告)日:2015-10-20

    申请号:US12418420

    申请日:2009-04-03

    IPC分类号: G03B27/72 G03B27/32 G03F7/20

    摘要: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

    摘要翻译: 曝光用光致抗蚀剂涂覆的基板以形成光致抗蚀剂的潜像的曝光装置包括原始保持单元,其被配置为保持包括相位调制衍射光栅的原稿,使得在基板的表面上形成干涉图案 通过由原稿衍射的光束,被配置为保持基板的基板保持单元和被配置为分割光束以形成进入原稿的多个光束的光束分割光学系统,其中形成潜像 通过在基板的表面上形成的多个干涉图案叠加在基板上,分别对应于进入原稿的多个光束的多个干涉图案。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    曝光装置和装置制造方法

    公开(公告)号:US20090257039A1

    公开(公告)日:2009-10-15

    申请号:US12418420

    申请日:2009-04-03

    IPC分类号: G03B27/54 G03B27/72 G03B27/32

    摘要: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

    摘要翻译: 曝光用光致抗蚀剂涂覆的基板以形成光致抗蚀剂的潜像的曝光装置包括原始保持单元,其被配置为保持包括相位调制衍射光栅的原稿,使得在基板的表面上形成干涉图案 通过由原稿衍射的光束,被配置为保持基板的基板保持单元和被配置为分割光束以形成进入原稿的多个光束的光束分割光学系统,其中形成潜像 通过在基板的表面上形成的多个干涉图案叠加在基板上,分别对应于进入原稿的多个光束的多个干涉图案。

    Exposure apparatus and method
    3.
    发明授权
    Exposure apparatus and method 失效
    曝光装置和方法

    公开(公告)号:US07616290B2

    公开(公告)日:2009-11-10

    申请号:US11413147

    申请日:2006-04-28

    申请人: Tokuyuki Honda

    发明人: Tokuyuki Honda

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70341

    摘要: An exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate, a supply pipe for supplying the liquid to the space between a final surface in the projection optical system and the plate, a recovery pipe for recovering the liquid from the space between the final surface in the projection optical system and the plate, and a measuring apparatus for measuring a refractive index of the liquid. The measuring apparatus includes (i) a cell for accommodating the liquid and transmitting light, wherein the cell is connected to one of the supply pipe and the recovery pipe, and (ii) a detector for detecting an incident position of the light refracted by the liquid in the cell.

    摘要翻译: 一种曝光装置,包括:投影光学系统,用于通过填充在投影光学系统和板之间的空间中的液体将掩模版图案投射到待曝光的板上;供应管,用于将液体供应到空间 在投影光学系统的最终表面和板之间,用于从投影光学系统中的最终表面与板之间的空间中回收液体的回收管和用于测量液体的折射率的测量装置。 测量装置包括:(i)用于容纳液体并透射光的单元,其中,所述单元连接到所述供给管和所述回收管中的一个,以及(ii)检测器,用于检测由所述供给管和所述回收管折射的光的入射位置 液体在细胞中。

    Exposure apparatus and method
    4.
    发明申请
    Exposure apparatus and method 失效
    曝光装置和方法

    公开(公告)号:US20060256308A1

    公开(公告)日:2006-11-16

    申请号:US11413147

    申请日:2006-04-28

    申请人: Tokuyuki Honda

    发明人: Tokuyuki Honda

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70341

    摘要: An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate, and a measuring apparatus for measuring a refractive index of the liquid, wherein said measuring apparatus includes a cell for accommodating the liquid and transmitting a light, and a detector for detecting an incident position of the light refracted by the liquid in the cell.

    摘要翻译: 曝光装置包括:投影光学系统,用于通过填充在投影光学系统和板之间的空间中的液体将掩模版的图案投射到要暴露的板上;以及测量装置,用于测量折射率 液体,其中所述测量设备包括用于容纳液体并传输光的单元,以及用于检测由液体在单元中折射的光的入射位置的检测器。

    Exposure apparatus and device manufacturing method
    5.
    发明申请
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号:US20060072094A1

    公开(公告)日:2006-04-06

    申请号:US11237486

    申请日:2005-09-27

    申请人: Tokuyuki Honda

    发明人: Tokuyuki Honda

    IPC分类号: G03B27/54

    摘要: An exposure apparatus includes a beam splitter for splitting light from a light source into first and second beams, a spatial light modulator, arranged in an optical path for the first beam, for modulating a phase distribution of the first beam, a beam coupler for coupling the first beam with the second beam, a projection optical system for projecting a pattern of the spatial light modulator onto a substrate using light from the beam coupler, and a controller for supplying a modulation signal to the spatial light modulator, wherein the spatial light modulator has a one-dimensionally or two-dimensionally arranged pixels, each pixel has plural reflective elements, and the reflective elements in the same pixel displace in the same direction simultaneously.

    摘要翻译: 曝光装置包括用于将来自光源的光分成第一和第二光束的分束器,布置在第一光束的光路中的用于调制第一光束的相位分布的空间光调制器,用于耦合的光束耦合器 具有第二光束的第一光束,用于使用来自光束耦合器的光将空间光调制器的图案投影到衬底上的投影光学系统,以及用于向空间光调制器提供调制信号的控制器,其中空间光调制器 具有一维或二维排列的像素,每个像素具有多个反射元件,并且同一像素中的反射元件同时沿相同方向移位。

    Recording medium storing original data generation program, original data generation method, original fabricating method, exposure method, and device manufacturing method
    7.
    发明授权
    Recording medium storing original data generation program, original data generation method, original fabricating method, exposure method, and device manufacturing method 有权
    存储原始数据生成程序,原始数据生成方法,原始制作方法,曝光方法和装置制造方法的记录介质

    公开(公告)号:US08321815B2

    公开(公告)日:2012-11-27

    申请号:US12512649

    申请日:2009-07-30

    IPC分类号: G06F17/50

    摘要: To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original.

    摘要翻译: 为了计算原稿的数据,使计算机执行将要在衬底上形成的期望图案的数据转换成频域数据的以下步骤,使用表示有效光的函数来计算二维透射交叉系数 来源是当投影光学系统的物体平面上不存在原稿并且使用投影光学系统的光瞳功能时,照明装置在投影光学系统的光瞳平面上形成,从根据投影光学系统的图案计算衍射光分布 使用计算出的二维透射交叉系数的至少一个分量的频域数据和数据在物平面上形成,并将计算出的衍射光分布的数据转换成空间域数据,以确定原始数据 。

    RECORDING MEDIUM STORING ORIGINAL DATA GENERATION PROGRAM, ORIGINAL DATA GENERATION METHOD, ORIGINAL FABRICATING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
    8.
    发明申请
    RECORDING MEDIUM STORING ORIGINAL DATA GENERATION PROGRAM, ORIGINAL DATA GENERATION METHOD, ORIGINAL FABRICATING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 有权
    记录存储原始数据生成程序,原始数据生成方法,原始制作方法,曝光方法和装置制造方法

    公开(公告)号:US20100037199A1

    公开(公告)日:2010-02-11

    申请号:US12512649

    申请日:2009-07-30

    IPC分类号: G06F17/50

    摘要: To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original.

    摘要翻译: 为了计算原稿的数据,使计算机执行将要在衬底上形成的期望图案的数据转换成频域数据的以下步骤,使用表示有效光的函数来计算二维透射交叉系数 来源是当投影光学系统的物体平面上不存在原稿并且使用投影光学系统的光瞳功能时,照明装置在投影光学系统的光瞳平面上形成,从根据投影光学系统的图案计算衍射光分布 使用计算出的二维透射交叉系数的至少一个分量的频域数据和数据在物平面上形成,并将计算出的衍射光分布的数据转换成空间域数据,以确定原始数据 。

    Immersion optical system and optical apparatus having the same
    9.
    发明申请
    Immersion optical system and optical apparatus having the same 失效
    浸入式光学系统及其相同的光学装置

    公开(公告)号:US20060146662A1

    公开(公告)日:2006-07-06

    申请号:US11319195

    申请日:2005-12-28

    IPC分类号: G11B7/00

    摘要: An immersion optical system that condenses light from a light source toward a first surface includes a lens having a concave lens surface closest to the first surface, a liquid being filled in a space between the concave lens surface and the first surface, wherein a conditional equation d>L/[2×tan {arcsin(NA/ni)}] is met, where d is a distance between a first point and a second point when the distance becomes maximum between the first point on the concave lens surface and the second point on the first surface in a direction substantially orthogonal to the first surface, L/2 is a maximum distance from the second point to an edge of an irradiation area of the light on a first surface, NA is a numerical aperture of the immersion optical system, and ni is a refractive index of the liquid.

    摘要翻译: 将来自光源的光朝向第一表面冷凝的浸没式光学系统包括具有最接近第一表面的凹透镜表面的透镜,在凹透镜表面和第一表面之间的空间中填充液体,其中条件方程 d> L / [2xtan {arcsin(NA / ni)),其中d是当凹透镜表面上的第一点与第一点之间的距离变为最大时第一点和第二点之间的距离 表面在与第一表面大致正交的方向上,L / 2是从第二点到第一表面上的光的照射区域的边缘的最大距离,NA是浸没式光学系统的数值孔径,ni 是液体的折射率。