摘要:
An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.
摘要:
An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.
摘要:
An exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate, a supply pipe for supplying the liquid to the space between a final surface in the projection optical system and the plate, a recovery pipe for recovering the liquid from the space between the final surface in the projection optical system and the plate, and a measuring apparatus for measuring a refractive index of the liquid. The measuring apparatus includes (i) a cell for accommodating the liquid and transmitting light, wherein the cell is connected to one of the supply pipe and the recovery pipe, and (ii) a detector for detecting an incident position of the light refracted by the liquid in the cell.
摘要:
An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate, and a measuring apparatus for measuring a refractive index of the liquid, wherein said measuring apparatus includes a cell for accommodating the liquid and transmitting a light, and a detector for detecting an incident position of the light refracted by the liquid in the cell.
摘要:
An exposure apparatus includes a beam splitter for splitting light from a light source into first and second beams, a spatial light modulator, arranged in an optical path for the first beam, for modulating a phase distribution of the first beam, a beam coupler for coupling the first beam with the second beam, a projection optical system for projecting a pattern of the spatial light modulator onto a substrate using light from the beam coupler, and a controller for supplying a modulation signal to the spatial light modulator, wherein the spatial light modulator has a one-dimensionally or two-dimensionally arranged pixels, each pixel has plural reflective elements, and the reflective elements in the same pixel displace in the same direction simultaneously.
摘要:
An apparatus and method for optical data storage and/or retrieval using an optical data storage medium having a spatially-modulated refractive index that can be altered locally with optical methods. Data can be written at a plurality of depths throughout the volume of the medium using a write beam and relatively simple and inexpensive optical components. The write beam stores data locally by physical distortion of the medium at discrete storage locations. The alterations can be detected as variations in the reflectivity of the storage locations using a retrieval beam.
摘要:
To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original.
摘要:
To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original.
摘要:
An immersion optical system that condenses light from a light source toward a first surface includes a lens having a concave lens surface closest to the first surface, a liquid being filled in a space between the concave lens surface and the first surface, wherein a conditional equation d>L/[2×tan {arcsin(NA/ni)}] is met, where d is a distance between a first point and a second point when the distance becomes maximum between the first point on the concave lens surface and the second point on the first surface in a direction substantially orthogonal to the first surface, L/2 is a maximum distance from the second point to an edge of an irradiation area of the light on a first surface, NA is a numerical aperture of the immersion optical system, and ni is a refractive index of the liquid.
摘要:
An optical information medium comprising at least two data layers for bearing recorded information, and a servo layer for bearing tracking servo, information which is independently formed from the data layers; wherein the medium is used with a recording or reading system wherein a data beam for recording or reading the data in the data layer and a servo beam for reading the tracking servo information in the servo layer are used, and the servo layer is read by the servo beam that had passed through the data layer; and a filter layer is disposed between the data layer and the servo layer, and the filter layer exhibits higher absorption to the data beam than to the servo beam.